Semiconductor device

ABSTRACT

A first transistor including a channel formation region, a first gate insulating layer, a first gate electrode, and a first source electrode and a first drain electrode; a second transistor including an oxide semiconductor layer, a second source electrode and a second drain electrode, a second gate insulating layer, and a second gate electrode; and a capacitor including one of the second source electrode and the second drain electrode, the second gate insulating layer, and an electrode provided to overlap with one of the second source electrode and the second drain electrode over the second gate insulating layer are provided. The first gate electrode and one of the second source electrode and the second drain electrode are electrically connected to each other.

TECHNICAL FIELD

The invention disclosed herein relates to a semiconductor deviceincluding a semiconductor element and a method for manufacturing thesemiconductor device.

BACKGROUND ART

Storage devices using semiconductor elements are broadly classified intotwo categories: a volatile device that loses stored data when powersupply stops, and a non-volatile device that retains stored data evenwhen power is not supplied.

A typical example of a volatile storage device is a DRAM (dynamic randomaccess memory). A DRAM stores data in such a manner that a transistorincluded in a storage element is selected and electric charge is storedin a capacitor.

When data is read from a DRAM, charge in a capacitor is lost on theabove-described principle; thus, another writing operation is necessaryevery time data is read out. Moreover, a transistor included in astorage element has a leakage current and electric charge flows into orout of a capacitor even when the transistor is not selected, so that thedata retention time is short. For that reason, another writing operation(refresh operation) is necessary at predetermined intervals, and it isdifficult to sufficiently reduce power consumption. Furthermore, sincestored data is lost when power supply stops, an additional storagedevice using a magnetic material or an optical material is needed inorder to retain the data for a long time.

Another example of a volatile storage device is an SRAM (static randomaccess memory). An SRAM retains stored data by using a circuit such as aflip-flop and thus does not need refresh operation. This means that anSRAM has an advantage over a DRAM. However, cost per storage capacity isincreased because a circuit such as a flip-flop is used. Moreover, as ina DRAM, stored data in an SRAM is lost when power supply stops.

A typical example of a non-volatile storage device is a flash memory. Aflash memory includes a floating gate between a gate electrode and achannel formation region in a transistor and stores data by retainingelectric charge in the floating gate. Therefore, a flash memory hasadvantages in that the data retention time is extremely long (almostpermanent) and refresh operation which is necessary in a volatilestorage device is not needed (e.g., see Patent Document 1).

However, a gate insulating layer included in a storage elementdeteriorates by tunneling current generated in writing, so that thestorage element stops its function after a predetermined number ofwriting operations. In order to reduce adverse effects of this problem,a method in which the numbers of writing operations for each storageelement are equalized is employed, for example. However, a complicatedperipheral circuit is needed to realize this method. Moreover, employingsuch a method does not solve the fundamental problem of lifetime. Inother words, a flash memory is not suitable for applications in whichdata is frequently rewritten.

In addition, high voltage is necessary for retaining electric charge inthe floating gate or removing the electric charge, and a circuittherefor is also needed. Further, it takes a relatively long time toretain or remove electric charge, and it is not easy to perform writingand erasing at higher speed.

REFERENCE Patent Document

-   [Patent Document 1] Japanese Published Patent Application No.    S57-105889

DISCLOSURE OF INVENTION

In view of the foregoing problems, an object of one embodiment of theinvention disclosed is to provide a semiconductor device with a novelstructure in which stored data can be retained even when power is notsupplied, and there is no limitation on the number of times of writing.

In the invention disclosed, a semiconductor device is formed using ahighly-purified oxide semiconductor. A transistor formed using ahighly-purified oxide semiconductor can retain data for a long timebecause leakage current thereof is extremely small.

An embodiment of the disclosed invention is a semiconductor devicecomprising a first transistor including a channel formation region,impurity regions with the channel formation region providedtherebetween, a first gate insulating layer provided over the channelformation region, a first gate electrode provided over the first gateinsulating layer, and a first source electrode and a first drainelectrode electrically connected to the impurity regions; a secondtransistor including an oxide semiconductor layer, a second sourceelectrode and a second drain electrode electrically connected to theoxide semiconductor layer, a second gate insulating layer to cover theoxide semiconductor layer, the second source electrode, and the seconddrain electrode, and a second gate electrode to overlap with the oxidesemiconductor layer over the second gate insulating layer; and acapacitor including one of the second source electrode and the seconddrain electrode, the second gate insulating layer, and an electrodeprovided to overlap with one of the second source electrode and thesecond drain electrode over the second gate insulating layer. The firstgate electrode and one of the second source electrode and the seconddrain electrode are electrically connected to each other.

An embodiment of the disclosed invention is a semiconductor devicecomprising a first transistor including a channel formation region,impurity regions with the channel formation region providedtherebetween, a first gate insulating layer provided over the channelformation region, a first gate electrode provided over the first gateinsulating layer, and a first source electrode and a first drainelectrode electrically connected to the impurity regions; a secondtransistor including an oxide semiconductor layer, a second sourceelectrode and a second drain electrode electrically connected to theoxide semiconductor layer, an insulating layer in contact with thesecond source electrode and the second drain electrode, a second gateinsulating layer provided to cover the oxide semiconductor layer, thesecond source electrode, the second drain electrode, and the insulatinglayer, and a second gate electrode provided to overlap with the oxidesemiconductor layer over the second gate insulating layer; and acapacitor including one of the second source electrode and the seconddrain electrode, the second gate insulating layer, and an electrodeprovided to overlap with one of the second source electrode and thesecond drain electrode over the second gate insulating layer. The firstgate electrode and one of the second source electrode and the seconddrain electrode are electrically connected to each other.

In the above description, the oxide semiconductor layer is preferably incontact with side surfaces or top surfaces of the second sourceelectrode and the second drain electrode. In addition, in the abovedescription, the second transistor and the capacitor are preferablyprovided above the first transistor.

Note that in this specification and the like, the term such as “over” or“below” does not necessarily mean that a component is placed “directlyon” or “directly under” another component. For example, the expression“a gate electrode over a gate insulating layer” does not exclude thecase where a component is placed between the gate insulating layer andthe gate electrode. Moreover, the terms such as “over” and “below” areonly used for convenience of description and can include the case wherethe relation of components is reversed, unless otherwise specified.

In addition, in this specification and the like, the term such as“electrode” or “wiring” does not limit a function of a component. Forexample, an “electrode” is sometimes used as part of a “wiring”, andvice versa. Furthermore, the term “electrode” or “wiring” can includethe case where a plurality of “electrodes” or “wirings” is formed in anintegrated manner.

Functions of a “source” and a “drain” are sometimes replaced with eachother when a transistor of opposite polarity is used or when thedirection of current flowing is changed in circuit operation, forexample. Therefore, the terms “source” and “drain” can be used to denotethe drain and the source, respectively, in this specification.

Note that in this specification and the like, the term “electricallyconnected” includes the case where components are connected through anobject having any electric function. There is no particular limitationon an object having any electric function as long as electric signalscan be transmitted and received between components that are connectedthrough the object.

Examples of an “object having any electric function” are a switchingelement such as a transistor, a resistor, an inductor, a capacitor, andan element with a variety of functions as well as an electrode and awiring.

An embodiment of the present invention provides a semiconductor devicehaving a structure in which a transistor including a material other thanan oxide semiconductor and a transistor including an oxide semiconductorare stacked.

Since the off current of a transistor including an oxide semiconductoris extremely low, stored data can be retained for an extremely long timeby using the transistor. In other words, power consumption can beadequately reduced because refresh operation becomes unnecessary or thefrequency of refresh operation can be extremely low. Moreover, storeddata can be retained for a long time even when power is not supplied.

Further, high voltage is not needed to write data, and deterioration ofthe element does not become a problem. For example, since there is noneed to perform injection of electrons to a floating gate or extractionof electrons from the floating gate which is needed in a conventionalnonvolatile memory, a problem such as deterioration of a gate insulatinglayer does not occur. That is, the semiconductor device according to oneembodiment of the present invention does not have a limit on the numberof times of writing which is a problem in a conventional nonvolatilememory, and reliability thereof is drastically improved. Furthermore,data is written depending on the on state and the off state of thetransistor, whereby high-speed operation can be easily realized. Inaddition, there is no need of operation for erasing data.

Since a transistor including a material other than an oxidesemiconductor can operate at sufficiently high speed, stored data can beread out at high speed by using the transistor.

A semiconductor device with a novel feature can be realized by includingboth the transistor including a material other than an oxidesemiconductor and the transistor including an oxide semiconductor.

BRIEF DESCRIPTION OF DRAWINGS

In the accompanying drawings:

FIGS. 1A and 1B are a cross-sectional view and a plan view of asemiconductor device;

FIGS. 2A to 2D are cross-sectional views of a semiconductor device;

FIGS. 3A1 and 3A2 and FIG. 3B are circuit diagrams of semiconductordevices;

FIGS. 4A to 4H are cross-sectional views relating to manufacturing stepsof a semiconductor device;

FIGS. 5A to 5E are cross-sectional views relating to manufacturing stepsof a semiconductor device;

FIGS. 6A and 6B are a cross-sectional view and a plan view of asemiconductor device;

FIGS. 7A to 7E are cross-sectional views relating to manufacturing stepsof a semiconductor device;

FIGS. 8A and 8B are circuit diagrams of semiconductor devices;

FIGS. 9A and 9B are a cross-sectional view and a plan view of asemiconductor device;

FIGS. 10A and 10B are cross-sectional views of semiconductor devices;

FIGS. 11A to 11E are cross-sectional views relating to manufacturingsteps of a semiconductor device;

FIGS. 12A to 12E are cross-sectional views relating to manufacturingsteps of a semiconductor device;

FIGS. 13A to 13D are cross-sectional views relating to manufacturingsteps of a semiconductor device;

FIGS. 14A to 14F are perspective views for describing electronicappliances; and

FIG. 15 is a graph showing investigation results of a memory windowwidth.

BEST MODE FOR CARRYING OUT THE INVENTION

Hereinafter, the embodiments and example of the present invention willbe described using the accompanying drawings. Note that the presentinvention is not limited to the following description and it will bereadily appreciated by those skilled in the art that modes and detailscan be modified in various ways without departing from the spirit andthe scope of the present invention. Therefore, the invention should notbe construed as being limited to the description in the followingembodiment modes.

Note that the position, the size, the range, or the like of eachstructure illustrated in drawings and the like is not accuratelyrepresented in some cases for easy understanding. Therefore, thedisclosed invention is not necessarily limited to the position, size,range, or the like as disclosed in the drawings and the like.

In this specification and the like, ordinal numbers such as “first”,“second”, and “third” are used in order to avoid confusion amongcomponents, and the terms do not mean limitation of the number ofcomponents.

Embodiment 1

In this embodiment, a structure and a manufacturing method of asemiconductor device according to one embodiment of the inventiondisclosed is described with reference to FIGS. 1A and 1B, FIGS. 2A to2D, FIGS. 3A1, A2, and 3B, FIGS. 4A to 4H, and FIGS. 5A to 5E. Note thatin each of circuit diagrams, in some cases, “OS” is written beside atransistor in order to indicate that the transistor includes an oxidesemiconductor.

<Planar Structure and Cross-Sectional Structure of Semiconductor Device>

FIGS. 1A and 1B illustrate an example of a structure of thesemiconductor device. FIG. 1A illustrates a cross section of thesemiconductor device, and FIG. 1B illustrates a plan view of thesemiconductor device. Here, FIG. 1A corresponds to a cross section takenalong lines A1-A2 and B1-B2 of FIG. 1B. In the semiconductor deviceillustrated in FIGS. 1A and 1B, a transistor 160 including a materialother than an oxide semiconductor is provided in a lower portion, and atransistor 162 including an oxide semiconductor and a capacitor 164 areprovided in an upper portion. Although the transistor 160 and thetransistor 162 are n-channel transistors here, it is needless to saythat p-channel transistors can be used. Since the technical nature ofthe disclosed invention is to use an oxide semiconductor in thetransistor 162 so that data can be retained, it is not necessary tolimit a specific structure of a semiconductor device to the structuredescribed here.

The transistor 160 includes a channel formation region 116 provided in asubstrate 100 containing a semiconductor material (e.g., silicon),impurity regions 114 and high-concentration impurity regions 120 (theimpurity regions 114 and the high-concentration impurity regions 120 arealso collectively referred to as impurity regions) with the channelformation region 116 provided therebetween, a gate insulating layer 108provided over the channel formation region 116, a gate electrode 110provided over the gate insulating layer 108, and a source or drainelectrode 130 a and a source or drain electrode 130 b which areelectrically connected to the impurity regions.

Here, sidewall insulating layers 118 are provided on side surfaces ofthe gate electrode 110. Moreover, the high-concentration impurityregions 120 are formed in the semiconductor substrate 100 so as not tooverlap with the sidewall insulating layers 118, when seen from above,and metal compound regions 124 are provided in contact with thehigh-concentration impurity regions 120. An element isolation insulatinglayer 106 is provided over the substrate 100 so as to surround thetransistor 160. An interlayer insulating layer 126 and an interlayerinsulating layer 128 are provided so as to cover the transistor 160. Thesource or drain electrode 130 a and the source or drain electrode 130 bare electrically connected to the metal compound regions 124 throughopenings formed in the interlayer insulating layers 126 and 128. Thatis, each of the source or drain electrode 130 a and the source or drainelectrode 130 b is electrically connected to the high-concentrationimpurity region 120 and the impurity region 114 through the metalcompound region 124. In addition, an electrode 130 c is electricallyconnected to the gate electrode 110 through an opening formed in theinterlayer insulating layers 126 and 128. Note that the sidewallinsulating layers 118 are not formed in some cases, for integration ofthe transistor 160.

The transistor 162 includes a source or drain electrode 142 a and asource or drain electrode 142 b which are provided over an insulatinglayer 138; an oxide semiconductor layer 140 electrically connected tothe source or drain electrode 142 a and the source or drain electrode142 b; an insulating layer 144 in contact with the source or drainelectrode 142 a, the source or drain electrode 142 b, and the oxidesemiconductor layer 140; a gate insulating layer 146 covering the sourceor drain electrode 142 a, the source or drain electrode 142 b, the oxidesemiconductor layer 140, and the insulating layer 144; and a gateelectrode 148 a provided so as to overlap with the oxide semiconductorlayer 140 over the gate insulating layer 146. Here, the insulating layer144 is provided so that capacitance caused by the gate electrode 148 aand the like is reduced. Note that in order to simplify process, astructure in which the insulating layer 144 is not provided can beemployed.

As described above, the transistor 162 illustrated in FIGS. 1A and 1B isa top-gate transistor, and can be referred to as a top-gatebottom-contact transistor because the oxide semiconductor layer 140 andthe source or drain electrode 142 a or the like are connected in aregion including a bottom surface of the oxide semiconductor layer 140.

Here, the oxide semiconductor layer 140 is preferably an oxidesemiconductor layer which is highly purified by sufficiently removing animpurity such as hydrogen therefrom or sufficiently supplying oxygenthereto. Specifically, for example, the hydrogen concentration of theoxide semiconductor layer 140 is less than or equal to 5×10¹⁹ atoms/cm³,preferably less than or equal to 5×10¹⁸ atoms/cm³, and more preferablyless than or equal to 5×10¹⁷ atoms/cm³. Note that the above hydrogenconcentration of the oxide semiconductor layer 140 is measured bysecondary ion mass spectrometry (SIMS). A carrier concentration which isless than 1×10¹²/cm³, preferably less than 1×10¹¹/cm³, and morepreferably less than 1.45×10¹⁹/cm³ is obtained in the oxidesemiconductor layer 140 which is highly purified by sufficientlyreducing the hydrogen concentration in such a manner and in which defectlevels in an energy gap caused by oxygen deficiency are reduced bysufficient supply of oxygen. For example, in the case where a channellength is 10 μm and the thickness of the oxide semiconductor layer is 30nm, when a drain voltage ranges from approximately 1 V to 10 V, offcurrent (a drain current when a gate-source voltage is less than orequal to 0 V) is less than or equal to 1×10⁻¹³ A. Further, off currentdensity (a value obtained by dividing the off current by a channel widthof the transistor) at room temperature is approximately 1×10⁻²⁰ A/μm (10zA/μm) to 1×10⁻¹⁹ A/μm (100 zA/μm). In addition, off resistivity isgreater than or equal to 1×10⁹ Ω·m, and preferably greater than or equalto 1×10¹⁰ Ω·m. In this manner, when such an oxide semiconductor which ismade to be i-type (intrinsic) or substantially i-type is used, thetransistor 162 having excellent off-current characteristic can beobtained.

The source or drain electrode 142 a is electrically connected to theelectrode 130 c. In other words, the source or drain electrode 142 a iselectrically connected to the gate electrode 110 of the transistor 160.In a similar manner, an electrode 142 c and an electrode 142 d areprovided in contact with the source or drain electrode 130 a and thesource or drain electrode 130 b, respectively.

The capacitor 164 is formed with the source or drain electrode 142 a,the gate insulating layer 146, and an electrode 148 b. That is to say,the source or drain electrode 142 a functions as one of electrodes ofthe capacitor 164, and the electrode 148 b functions as the otherelectrode of the capacitor 164.

A protective insulating layer 150 is provided over the transistor 162and the capacitor 164, and an interlayer insulating layer 152 isprovided over the protective insulating layer 150.

<Modified Examples of Transistor and Capacitor in Upper Portion>

Next, modified examples of the transistor and the capacitor in the upperportion in FIG. 1A are illustrated in FIGS. 2A to 2D.

A transistor and a capacitor illustrated in FIG. 2A is a modifiedexample of the transistor and the capacitor in the upper portion of thesemiconductor device illustrated in FIGS. 1A and 1B.

The structure illustrated in FIG. 2A is different from the structureillustrated in FIG. 1A in that the insulating layer 144 is provided overthe source or drain electrode 142 a and the source or drain electrode142 b, and the oxide semiconductor layer 140 covers the insulating layer144, the source or drain electrode 142 a, and the source or drainelectrode 142 b. In addition, the oxide semiconductor layer 140 isprovided in contact with the source or drain electrode 142 a through anopening provided in the insulating layer 144.

Further, in the transistors and the capacitors illustrated in FIGS. 2Ato 2D, edge portions of the source or drain electrode 142 a, the sourceor drain electrode 142 b, and the insulating layer 144 preferably havetapered shapes. Here, a taper angle is, for example, preferably greaterthan or equal to 30° and less than or equal to 60°. Note that the taperangle refers to an inclination angle formed with a side surface and abottom surface of a layer having a tapered shape (for example, thesource or drain electrode 142 a) when seen from a directionperpendicular to a cross section (a plane perpendicular to a surface ofa substrate) of the layer. When the edge portions of the source or drainelectrode 142 a and the source or drain electrode 142 b have taperedshapes, coverage with the oxide semiconductor layer 140 can be improvedand disconnection due to a step can be prevented.

In the structure illustrated in FIG. 2A, since the oxide semiconductorlayer 140 is not processed, mixing of a contaminant to the oxidesemiconductor layer 140 due to etching performed in processing can beavoided. Further, in the capacitor 164, when the oxide semiconductorlayer 140 and the gate insulating layer 146 are stacked, insulationbetween the source or drain electrode 142 a and the electrode 148 b canbe ensured sufficiently.

A transistor and a capacitor illustrated in FIG. 2B have a structurepartly different from that of the transistor and the capacitor of FIG.2A.

The structure illustrated in FIG. 2B is different from the structureillustrated in FIG. 2A in that an oxide semiconductor is formed to havean island shape. In other words, the oxide semiconductor layer 140covers the insulating layer 144, the source or drain electrode 142 a,and the source or drain electrode 142 b as a whole in the structure inFIG. 2A, whereas in the structure in FIG. 2B, the oxide semiconductorlayer has an island shape, whereby the oxide semiconductor layer coverspart of the insulating layer 144, the source or drain electrode 142 a,and the source or drain electrode 142 b. Here, an edge portion of theisland-shaped oxide semiconductor layer 140 preferably has a taperedshape. The taper angle thereof is, for example, preferably greater thanor equal to 30° and less than or equal to 60°.

Further, in the capacitor 164, when the oxide semiconductor layer 140and the gate insulating layer 146 are stacked, insulation between thesource or drain electrode 142 a and the electrode 148 b can be ensuredsufficiently.

A transistor and a capacitor illustrated in FIG. 2C have a structurepartly different from that of the transistor and the capacitor of FIG.2A.

The structure in FIG. 2C is different from the structure illustrated inFIG. 2A in that the insulating layer 144 is not provided in thetransistor 162 and the capacitor 164. Since the insulating layer 144 isnot provided in the structure illustrated in FIG. 2C, the manufacturingprocess is simplified and the manufacturing cost is reduced as comparedto the transistor and the capacitor illustrated in FIG. 2A.

In the structure illustrated in FIG. 2C, since the oxide semiconductorlayer 140 is not processed, mixing of a contaminant to the oxidesemiconductor layer 140 due to etching performed in processing can beavoided. Further, in the capacitor 164, when the oxide semiconductorlayer 140 and the gate insulating layer 146 are stacked, insulationbetween the source or drain electrode 142 a and the electrode 148 b canbe ensured sufficiently.

A transistor and a capacitor illustrated in FIG. 2D have a structurepartly different from that of the transistor and the capacitor of FIG.2B.

The structure of FIG. 2D is different from the structure illustrated inFIG. 2B in that the insulating layer 144 is not provided in thetransistor 162 and the capacitor 164. When the insulating layer 144 isnot provided in the transistor 162 and the capacitor 164, manufacturingprocess is simplified and manufacturing cost is reduced as compared tothe case of FIG. 2B.

Further, in the capacitor 164, when the oxide semiconductor layer 140and the gate insulating layer 146 are stacked, insulation between thesource or drain electrode 142 a and the electrode 148 b can be ensuredsufficiently.

<Circuit Configuration and Operation of Semiconductor Device>

Next, examples of a circuit configuration of the semiconductor deviceand operation thereof are described. FIG. 3A1 illustrates an example ofa circuit configuration corresponding to the semiconductor deviceillustrated in FIGS. 1A and 1B.

In the semiconductor device illustrated in FIG. 3A1, a first wiring (a1st line, also referred to as a source line) is electrically connectedto a source electrode of the transistor 160. A second wiring (a 2ndline, also referred to as a bit line) is electrically connected to adrain electrode of the transistor 160. Further, a third wiring (a 3rdline, also referred to as a first signal line) is electrically connectedto the other of the source electrode and the drain electrode of thetransistor 162, and a fourth wiring (a 4th line, also referred to as asecond signal line) is electrically connected to a gate electrode of thetransistor 162. Furthermore, the gate electrode of the transistor 160and one of the source electrode and the drain electrode of thetransistor 162 are electrically connected to one of the electrodes ofthe capacitor 164. A fifth wiring (a 5th line, also referred to as aword line) is electrically connected to the other electrode of thecapacitor 164.

Since the transistor 160 including a material other than an oxidesemiconductor can operate at sufficiently high speed, stored data can beread out at high speed by using the transistor 160. Moreover, thetransistor 162 including an oxide semiconductor has extremely low offcurrent. For that reason, a potential of the gate electrode of thetransistor 160 can be retained for an extremely long time by turning offthe transistor 162. By providing the capacitor 164, retention of chargegiven to the gate electrode of the transistor 160 and reading of storeddata can be performed easily.

The semiconductor device in this embodiment makes use of acharacteristic in which the potential of the gate electrode of thetransistor 160 can be retained, thereby writing, retention, and readingdata as follows.

Firstly, writing and retention of data are described. First, thepotential of the fourth wiring is set to a potential at which thetransistor 162 is turned on, so that the transistor 162 is turned on.Accordingly, the potential of the third wiring is supplied to the gateelectrode of the transistor 160 and one of the electrodes of thecapacitor 164. That is, predetermined charge is given to the gateelectrode of the transistor 160 (writing). Here, any of two chargesgiving different potential levels (hereinafter also referred to as alow-level charge and a high-level charge) is given. After that, thepotential of the fourth wiring is set to a potential at which thetransistor 162 is turned off, so that the transistor 162 is turned off.Thus, the charge given to the gate electrode of the transistor 160 isretained (retention).

Since the off current of the transistor 162 is significantly small, thecharge of the gate electrode of the transistor 160 is retained for along time.

Secondly, reading of data will be described. By supplying an appropriatepotential (reading potential) to the fifth wiring while a predeterminedpotential (constant potential) is supplied to the first wiring, thepotential of the second wiring varies depending on the amount of chargeretained in the gate electrode of the transistor 160. This is because ingeneral, when the transistor 160 is an n-channel transistor, an apparentthreshold voltage V_(th) _(—) _(H) in the case where a high-level chargeis given to the gate electrode of the transistor 160 is lower than anapparent threshold voltage V_(th) _(—) _(L) in the case where alow-level charge is given to the gate electrode of the transistor 160.Here, an apparent threshold voltage refers to the potential of the fifthwiring, which is needed to turn on the transistor 160. Thus, thepotential of the fifth wiring is set to a potential V₀ intermediatebetween V_(th) _(—) _(H) and V_(th) _(—) _(L), whereby charge given tothe gate electrode of the transistor 160 can be determined. For example,in the case where a high-level charge is given in writing, when thepotential of the fifth wiring is set to V₀ (>V_(th) _(—) _(H)), thetransistor 160 is turned on. In the case where a low level charge isgiven in writing, even when the potential of the fifth wiring is set toV₀ (<V_(th) _(—) _(L)), the transistor 160 remains in an off state.Therefore, the stored data can be read by the potential of the secondline

Note that in the case data is not read out, a potential at which thetransistor 160 is turned off, that is, a potential smaller than V_(th)_(—) _(H) may be given to the fifth wiring regardless of the state ofthe gate electrode of the transistor 160. Alternatively, a potential atwhich the transistor 160 is turned on, that is, a potential higher thanV_(th) _(—) _(L) may be given to the fifth wiring regardless of thestate of the gate electrode of the transistor 160.

Thirdly, rewriting of data will be described. Rewriting of data isperformed in a manner similar to that of the writing and retention ofdata. That is, the potential of the fourth wiring is set to a potentialwhich at which the transistor 162 is turned on, whereby the transistor162 is turned on. Accordingly, the potential of the third wiring(potential related to new data) is supplied to the gate electrode of thetransistor 160 and one of the electrodes of the capacitor 164. Afterthat, the potential of the fourth wiring is set to a potential at whichthe transistor 162 is turned off, whereby the transistor 162 is turnedoff. Accordingly, charge related to new data is given to the gateelectrode of the transistor 160.

In the semiconductor device according to the invention disclosed herein,data can be directly rewritten by another writing of data as describedabove. For that reason, erasing operation which is necessary for a flashmemory or the like is not needed, so that a reduction in operation speedbecause of erasing operation can be prevented. In other words,high-speed operation of the semiconductor device can be realized.

Note that the source electrode or the drain electrode of the transistor162 is electrically connected to the gate electrode of the transistor160, thereby having an effect similar to that of a floating gate of afloating gate transistor used for a nonvolatile memory element.Therefore, a portion in the drawing where the source electrode or thedrain electrode of the transistor 162 is electrically connected to thegate electrode of the transistor 160 is called a floating gate portionFG in some cases. When the transistor 162 is off, the floating gateportion FG can be regarded as being embedded in an insulator and thuscharge is retained in the floating gate portion FG. The amount of offcurrent in the transistor 162 including an oxide semiconductor issmaller than or equal to one hundred thousandth of the amount of offcurrent of the transistor 160 including a silicon semiconductor or thelike; thus, lost of the charge accumulated in the floating gate portionFG due to a leakage current of the transistor 162 is negligible. Thatis, with the transistor 162 including an oxide semiconductor, anonvolatile memory device can be realized.

For example, when the off current density of the transistor 162 isapproximately 10 zA/μm (1 zA (zeptoampere) is 1×10⁻²¹ A) at roomtemperature and the capacitance value of the capacitor 164 isapproximately 1 pF, data can be retained for 10⁶ seconds or longer. Itis needless to say that the retention time depends on transistorcharacteristics and the capacitance value.

Further, in this case, the problem of deterioration of a gate insulatingfilm (tunnel insulating film), which is pointed out in a conventionalfloating gate transistor, can be avoided. That is to say, the problem ofdeterioration of a gate insulating film due to injection of an electroninto a floating gate can be solved. Accordingly, in the semiconductordevice described in this embodiment, there is no limit on the number oftimes of writing in principle. Furthermore, high voltage needed forwriting or erasing in a conventional floating gate transistor is notnecessary.

The components such as transistors in the semiconductor device in FIG.3A1 can be regarded as being formed with a resistor and a capacitor andreplaced with such a circuit illustrated in FIG. 3A2. That is, in FIG.3A2, the transistor 160 and the capacitor 164 are each regarded asincluding a resistor and a capacitor. R1 and C1 denote the resistancevalue and the capacitance value of the capacitor 164, respectively. Theresistance value R1 corresponds to the resistance value which depends onan insulating layer included in the capacitor 164. R2 and C2 denote theresistance value and the capacitance value of the transistor 160,respectively. The resistance value R2 corresponds to a resistance valuewhich depends on a gate insulating layer at the time when the transistor160 is in an on state. The capacitance value C2 corresponds to the valueof a so-called gate capacitor (a capacitor formed between the gateelectrode and the source electrode or the drain electrode). Note thatsince the resistance value R2 only denotes the resistance value betweenthe gate electrode and the channel formation region of the transistor160, in order to clarify this point, part of connection is denoted by adotted line.

Assuming that the resistance value (also referred to as effectiveresistance) between the source electrode and the drain electrode in thecase where the transistor 162 is in an off state is ROS, when R1≧ROS andR2≧ROS are satisfied, an electron retention period (also referred to asa data retention period) is determined mainly by an off current of thetransistor 162.

On the other hand, when the condition is not satisfied, it is difficultto sufficiently ensure the retention period even if the off current ofthe transistor 162 is small enough. This is because leakage currentother than the leakage current occurred in the transistor 162 is large.Thus, it can be said that the semiconductor device disclosed in thisembodiment desirably secures the above relation.

Meanwhile, it is desirable that C1≧C2 be satisfied. This is because ifC1 is large, the potential of the fifth wiring can be suppressed so asto be low when the potential of the floating gate portion FG iscontrolled by the fifth wiring (e.g., at the time of reading).

When the above relation is secured, a more preferable semiconductordevice can be realized. In this embodiment, R1 and R2 are controlled bythe gate insulating layer 108, the gate insulating layer 146, or thelike. The same applies to C1 and C2. Therefore, the material, thethickness, and the like of the gate insulating layer are desirably setas appropriate to secure the above relation.

FIG. 3B illustrates a semiconductor device which is partly differentfrom the above semiconductor device. In the semiconductor illustrated inFIG. 3B, a gate electrode of the transistor 160, one of a sourceelectrode and a drain electrode of a transistor 166, and one ofelectrodes of the capacitor 164 are electrically connected to oneanother. The first wiring and the source electrode of the transistor 160are electrically connected to each other. The second wiring and thedrain electrode of the transistor 160 are electrically connected to eachother. The third wiring and the other of the source electrode and thedrain electrode of the transistor 166 are electrically connected to eachother. The fourth wiring and a first gate electrode of the transistor166 are electrically connected to each other. The fifth wiring and theother electrode of the capacitor 164 are electrically connected to eachother. A sixth wiring and a second gate electrode of the transistor 166are electrically connected to each other. A potential which is the sameas that applied to the fourth wiring may be applied to the sixth wiring.Alternatively, a potential which is different from that applied to thefourth wiring may be applied to the sixth wiring so as to be controlledindependently of the fourth wiring.

In other words, the semiconductor device illustrated in FIG. 3B has astructure in which the transistor 162 of the semiconductor device inFIG. 3A1 is replaced with the transistor 166, which has the second gateelectrode. Accordingly, in the semiconductor device in FIG. 3B, aneffect of easily controlling electrical characteristics (e.g., athreshold voltage) of the transistor 166 can be obtained in addition tothe effect obtained in the semiconductor device in FIG. 3A1. Forexample, when a negative potential is applied to the sixth wiring, thetransistor 166 can be made to be a normally-off transistor easily.

Note that an n-channel transistor in which electrons are majoritycarriers is used in the above description; it is needless to say that ap-channel transistor in which holes are majority carriers can be usedinstead of the n-channel transistor.

<Method for Manufacturing Semiconductor Device>

Next, an example of a method for manufacturing a semiconductor deviceillustrated in FIGS. 1A and 1B and FIG. 3A1 will be describedhereinafter. First, a method for manufacturing the transistor 160 in thelower portion will be described below with reference to FIGS. 4A to 4H,and then a method for manufacturing the transistor 162 and the capacitor164 in the upper portion will be described with reference to FIGS. 5A to5E.

<Method for Manufacturing Transistor in Lower Portion>

First, the substrate 100 including a semiconductor material is prepared(see FIG. 4A). As the substrate 100 including a semiconductor material,a single crystal semiconductor substrate or a polycrystallinesemiconductor substrate made of silicon, silicon carbide, or the like; acompound semiconductor substrate made of silicon germanium or the like;an SOI substrate; or the like can be used. Here, an example of using asingle crystal silicon substrate as the substrate 100 including asemiconductor material is described. Note that in general, the term “SOIsubstrate” means a substrate where a silicon semiconductor layer isprovided on an insulating surface. In this specification and the like,the term “SOI substrate” also includes a substrate where a semiconductorlayer formed using a material other than silicon is provided over aninsulating surface in its category. That is a semiconductor layerincluded in the “SOI substrate” is not limited to a siliconsemiconductor layer. Moreover, the SOI substrate can be a substratehaving a structure in which a semiconductor layer is provided over aninsulating substrate such as a glass substrate, with an insulating layerprovided therebetween.

A protective layer 102 serving as a mask for forming an elementisolation insulating layer is formed over the substrate 100 (see FIG.4A). As the protective layer 102, an insulating layer formed usingsilicon oxide, silicon nitride, silicon nitride oxide, or the like canbe used, for example. Note that before or after this step, an impurityelement imparting n-type conductivity or an impurity element impartingp-type conductivity may be added to the substrate 100 in order tocontrol the threshold voltage of the transistor. When the semiconductoris formed using silicon, phosphorus, arsenic, or the like can be used asthe impurity imparting n-type conductivity. Boron, aluminum, gallium, orthe like can be used as the impurity imparting p-type conductivity.

Next, part of the substrate 100 in a region which is not covered withthe protective layer 102 (exposed region) is etched with use of theprotective layer 102 as a mask. Thus, an isolated semiconductor region104 is formed (see FIG. 4B). As the etching, dry etching is preferablyperformed, but wet etching can be performed. An etching gas and anetchant can be selected as appropriate depending on a material of layersto be etched.

Then, an insulating layer is formed to cover the semiconductor region104, and the insulating layer in a region overlapping with thesemiconductor region 104 is selectively removed, so that elementisolation insulating layers 106 are formed (see FIG. 4B). The insulatinglayer is formed using silicon oxide, silicon nitride, silicon nitrideoxide, or the like. As a method for removing the insulating layer, anyof etching treatment and polishing treatment such as CMP can beemployed. Note that the protective layer 102 is removed after formationof the semiconductor region 104 or after formation of the elementisolation insulating layers 106.

Next, an insulating layer is formed over the semiconductor region 104,and a layer including a conductive material is formed over theinsulating layer.

The insulating layer serves later as a gate insulating layer, and isformed by CVD method, a sputtering method, or the like to be a singlelayer of a silicon oxide film, a silicon nitride oxide film, a siliconnitride film, a hafnium oxide film, an aluminum oxide film, a tantalumoxide film, or the like or a stacked layer including any of the abovefilms. Alternatively, the insulating layer may be formed in such amanner that a surface of the semiconductor region 104 is oxidized ornitrided by high-density plasma treatment or thermal oxidationtreatment. The high-density plasma treatment can be performed using, forexample, a mixed gas of a rare gas such as He, Ar, Kr, or Xe and a gassuch as oxygen, nitrogen oxide, ammonia, nitrogen, or hydrogen. There isno particular limitation on the thickness of the insulating layer, butthe insulating layer can be formed in the range of greater than or equalto 1 nm and less than or equal to 100 nm, for example.

The layer including a conductive material can be formed using a metalmaterial such as aluminum, copper, titanium, tantalum, or tungsten. Thelayer including a conductive material may be formed using asemiconductor material such as polycrystalline silicon. There is noparticular limitation on the method for forming the layer containing aconductive material, and a variety of deposition methods such as anevaporation method, a CVD method, a sputtering method, or a spin coatingmethod can be employed. Note that this embodiment describes an exampleof the case where the layer containing a conductive material is formedusing a metal material.

After that, by selectively etching the insulating layer and the layercontaining a conductive material, the gate insulating layer 108 and thegate electrode 110 are formed (see FIG. 4C).

Next, an insulating layer 112 that covers the gate electrode 110 isformed (see FIG. 4C). Phosphorus (P), arsenic (As), or the like is thenadded to the semiconductor region 104, whereby the impurity regions 114with a shallow junction depth are formed (see FIG. 4C). Note thatphosphorus or arsenic is added here in order to form an n-channeltransistor; an impurity element such as boron (B) or aluminum (Al) maybe added in the case of forming a p-channel transistor. With formationof the impurity regions 114, the channel formation region 116 is formedin the semiconductor region 104 below the gate insulating layer 108 (seeFIG. 4C). Here, the concentration of the impurity added can be set asappropriate; the concentration is preferably increased when the size ofa semiconductor element is extremely decreased. The step in which theimpurity regions 114 are formed after the formation of the insulatinglayer 112 is employed here; alternatively, the insulating layer 112 maybe formed after the formation of the impurity regions 114.

Next, the sidewall insulating layers 118 are formed (see FIG. 4D). Aninsulating layer is formed so as to cover the insulating layer 112 andthen subjected to highly anisotropic etching, whereby the sidewallinsulating layers 118 can be formed in a self-aligned manner. At thistime, it is preferable to partly etch the insulating layer 112 so that atop surface of the gate electrode 110 and top surfaces of the impurityregions 114 are exposed.

Then, an insulating layer is formed so as to cover the gate electrode110, the impurity regions 114, the sidewall insulating layers 118, andthe like. Phosphorus (P), arsenic (As), or the like is then added toregions of the impurity regions 114 which are in contact with theinsulating layer, whereby the high-concentration impurity regions 120are formed (see FIG. 4E). After that, the insulating layer is removed,and a metal layer 122 is formed so as to cover the gate electrode 110,the sidewall insulating layers 118, the high-concentration impurityregions 120, and the like (see FIG. 4E). A variety of deposition methodssuch as a vacuum evaporation method, a sputtering method, or a spincoating method can be employed for forming the metal layer 122. Themetal layer 122 is preferably formed using a metal material that reactswith a semiconductor material included in the semiconductor region 104to be a low-resistance metal compound. Examples of such metal materialsinclude titanium, tantalum, tungsten, nickel, cobalt, and platinum.

Next, heat treatment is performed so that the metal layer 122 reactswith the semiconductor material. Thus, the metal compound regions 124that are in contact with the high-concentration impurity regions 120 areformed (see FIG. 4F). Note that when the gate electrode 110 is formedusing polycrystalline silicon or the like, a metal compound region isalso formed in a region of the gate electrode 110 in contact with themetal layer 122.

As the heat treatment, irradiation with a flash lamp can be employed,for example. Although it is needless to say that another heat treatmentmethod may be used, a method by which heat treatment for an extremelyshort time can be achieved is preferably used in order to improve thecontrollability of chemical reaction in formation of the metal compound.Note that the metal compound regions are formed by reaction of the metalmaterial and the semiconductor material and have sufficiently highconductivity. The formation of the metal compound regions can properlyreduce the electric resistance and improve element characteristics. Notethat the metal layer 122 is removed after the metal compound regions 124are formed.

Then, the interlayer insulating layer 126 and the interlayer insulatinglayer 128 are formed to cover the components formed in the above steps(see FIG. 4G). The interlayer insulating layers 126 and 128 can beformed using an inorganic insulating material such as silicon oxide,silicon nitride oxide, silicon nitride, hafnium oxide, aluminum oxide,or tantalum oxide. Moreover, the interlayer insulating layers 126 and128 can be formed using an organic insulating material such as polyimideor acrylic resin. Although the interlayer insulating layer here has astructure including two layers of the interlayer insulating layer 126and the interlayer insulating layer 128, the structure of the interlayerinsulating layer is not limited thereto. After formation of theinterlayer insulating layer 128, a surface of the interlayer insulatinglayer 128 is preferably planarized with CMP, etching, or the like.

Then, openings that reach the metal compound regions 124 are formed inthe interlayer insulating layers, and the source or drain electrode 130a and the source or drain electrode 130 b are formed in the openings(see FIG. 4H). The source or drain electrode 130 a and the source ordrain electrode 130 b can be formed in such a manner, for example, thata conductive layer is formed in a region including the openings by a PVDmethod, a CVD method, or the like and then part of the conductive layeris removed by etching, CMP, or the like.

Specifically, it is possible to employ a method, for example, in which athin titanium film is formed in a region including the openings by a PVDmethod and a thin titanium nitride film is formed by a CVD method, andthen, a tungsten film is formed so as to be embedded in the openings.Here, the titanium film formed by a PVD method has a function ofreducing a surface of an oxide film (e.g., a native oxide film), overwhich the titanium film is formed, to decrease the contact resistancewith the lower electrodes (e.g., the metal compound region 124, here).The titanium nitride film formed after the formation of the titaniumfilm has a barrier function of preventing diffusion of the conductivematerial. A copper film may be formed by a plating method after theformation of the barrier film of titanium, titanium nitride, or thelike.

Note that in the case where the source or drain electrode 130 a and thesource or drain electrode 130 b are formed by removing part of theconductive layer, the process is preferably performed so that thesurfaces are planarized. For example, when a thin titanium film or athin titanium nitride film is formed in a region including the openingsand then a tungsten film is formed so as to be embedded in the openings,excess tungsten, titanium, titanium nitride, or the like is removed andthe planarity of the surface can be improved by subsequent CMP. Thesurface including the source or drain electrode 130 a and the source ordrain electrode 130 b is planarized in such a manner, so that anelectrode, a wiring, an insulating layer, a semiconductor layer, and thelike can be favorably formed in later steps.

Note that only the source or drain electrode 130 a and the source ordrain electrode 130 b in contact with the metal compound regions 124 areshown here; however, the electrode 130 c that is in contact with thegate electrode 110 and the like can also be formed in this step. Thereis no particular limitation on a material used for the source or drainelectrode 130 a and the source or drain electrode 130 b, and a varietyof conductive materials can be used. For example, a conductive materialsuch as molybdenum, titanium, chromium, tantalum, tungsten, aluminum,copper, neodymium, or scandium can be used. In consideration of heattreatment performed later, the source or drain electrode 130 a and thesource or drain electrode 130 b are preferably formed using a materialwhich has heat resistance high enough to withstand the heat treatmentperformed later.

In this manner, the transistor 160 using the substrate 100 including asemiconductor material is formed (see FIG. 4H). Note that an electrode,a wiring, an insulating layer, or the like may be further formed afterthe above step. When the wirings have a stacked-layer structure of alayered structure including an interlayer insulating layer and aconductive layer, a highly integrated semiconductor device can beprovided.

<Method for Manufacturing Transistor in Upper Portion>

Next, steps for manufacturing the transistor 162 over the interlayerinsulating layer 128 will be described with reference to FIGS. 5A to 5E.Note that FIGS. 5A to 5E illustrate steps for manufacturing electrodes,the transistor 162, and the like over the interlayer insulating layer128; therefore, details of the transistor 160 and the like placed belowthe transistor 162 are omitted.

First, an insulating layer 138 is formed over the interlayer insulatinglayer 128, the source or drain electrode 130 a, the source or drainelectrode 130 b, and the electrode 130 c. The insulating layer 138 canbe formed by a PVD method, a CVD method, or the like. The insulatinglayer 138 can be formed using an inorganic insulating material such assilicon oxide, silicon nitride oxide, silicon nitride, hafnium oxide,aluminum oxide, or tantalum oxide. Note that the insulating layer 138functions as a base of the transistor 162. The insulating layer 138 isnot necessarily provided.

Next, openings that reach the source or drain electrode 130 a, thesource or drain electrode 130 b, and the electrode 130 c are formed inthe insulating layer 138 (see FIG. 5A). The openings can be formed by amethod such as etching with the use of a mask. The mask can be formed byexposure with use of a photomask or the like. Either wet etching or dryetching may be used as the etching; dry etching is preferably used interms of microfabrication. Note that in the case where the insulatinglayer 138 is not provided, this step can be omitted.

Next, the source or drain electrode 142 a, the source or drain electrode142 b, the electrode 142 c, and the electrode 142 d are formed (see FIG.5B). The source or drain electrode 142 a, the source or drain electrode142 b, the electrode 142 c, and the electrode 142 d can be formed insuch a manner that a conductive layer is formed so as to cover theinsulating layer 138 and then is selectively etched.

The conductive layer can be formed by a PVD method typified by asputtering method or a CVD method such as a plasma CVD method. As amaterial for the conductive layer, an element selected from aluminum,chromium, copper, tantalum, titanium, molybdenum, or tungsten; an alloycontaining any of these elements as a component; or the like can beused. Alternatively, one or more materials selected from manganese,magnesium, zirconium, beryllium, and thorium may be used. Aluminumcombined with one or more of elements selected from titanium, tantalum,tungsten, molybdenum, chromium, neodymium, or scandium may be used. Theconductive layer can have a single-layer structure or a stacked-layerstructure including two or more layers. For example, the conductivelayer can have a single-layer structure of an aluminum film containingsilicon, a two-layer structure in which a titanium film is stacked overan aluminum film, or a three-layer structure in which a titanium film,an aluminum film, and a titanium film are stacked in this order.

The conductive layer may also be formed using a conductive metal oxide.As the conductive metal oxide, indium oxide (In₂O₃), tin oxide (SnO₂),zinc oxide (ZnO), an indium oxide-tin oxide alloy (In₂O₃—SnO₂, which isabbreviated to ITO in some cases), an indium oxide-zinc oxide alloy(In₂O₃—ZnO), or any of these metal oxide materials in which silicon orsilicon oxide is included can be used.

The channel length (L) of the transistor is determined by a distancebetween a lower edge portion of the source or drain electrode 142 a anda lower edge portion of the source or drain electrode 142 b. In the casewhere the channel length (L) is less than 25 nm, a mask for the etchingis preferably formed with the use of extreme ultraviolet having awavelength of several nanometers to several tens of nanometers. Lightexposure with extreme ultraviolet leads to a high resolution and a largedepth of focus. Accordingly, a pattern in which the channel length (L)is less than 25 nm can be formed, and also, the channel length (L) canbe greater than or equal to 10 nm and less than or equal to 1000 nm. Inthis manner, the transistor with a small channel length is preferablebecause the transistor with a small channel length leads to highoperation speed of a circuit and low power consumption.

In addition, end portions of the source or drain electrode 142 a and thesource or drain electrode 142 b are preferably formed to have taperedshapes. This is because when the end portions of the source or drainelectrode 142 a and the source or drain electrode 142 b have taperedshapes, coverage with an oxide semiconductor layer to be formed latercan be increased and disconnection can be prevented. Here, a taper angleis, for example, preferably greater than or equal to 30° and less thanor equal to 60°. Note that the taper angle refers to an inclinationangle formed with a side surface and a bottom surface of a layer havinga tapered shape (for example, the source or drain electrode 142 a) whenseen from a direction perpendicular to a cross section (a planeperpendicular to a surface of a substrate) of the layer.

Next, an oxide semiconductor layer is formed to cover the source ordrain electrode 142 a, the source or drain electrode 142 b, and thelike, and then processed by a method such as etching with the use of amask, so that the island-shaped oxide semiconductor layer 140 is formed(see FIG. 5C).

The oxide semiconductor layer is preferably formed using a sputteringmethod. As the oxide semiconductor layer, a four-component metal oxidesuch as an In—Sn—Ga—Zn—O-based film; a three-component metal oxide suchas an In—Ga—Zn—O-based film, an In—Sn—Zn—O-based film, allIn—Al—Zn—O-based film, a Sn—Ga—Zn—O-based film, an Al—Ga—Zn—O-basedfilm, and a Sn—Al—Zn—O-based film; a two-component metal oxide such asan In—Zn—O-based film, a Sn—Zn—O-based film, an Al—Zn—O-based film, aZn—Mg—O-based film, a Sn—Mg—O-based film, an In—Mg—O-based film; or anIn—O-based film, a Sn—O-based film, or a Zn—O-based film can be used.Note that silicon may be added into the metal oxide. For example, theoxide semiconductor layer may be formed with the use of a targetcontaining SiO₂ at 2 wt % to 10 wt % inclusive.

In particular, when an In—Ga—Zn—O-based metal oxide is used, asemiconductor device which has sufficiently high resistance(sufficiently low off current) when there is no electric field and hashigh field-effect mobility can be formed. In view of this point, theIn—Ga—Zn—O-based metal oxide is suitable for a semiconductor materialused for the semiconductor device.

As a typical example of the In—Ga—Zn—O-based metal oxide, onerepresented by InGaO₃ (ZnO)_(m) (m>0) is given. In addition, onerepresented by InMO₃(ZnO)_(m) (m>0) is given using M instead of Ga.Here, M denotes one or more of metal elements selected from gallium(Ga), aluminum (Al), iron (Fe), nickel (Ni), manganese (Mn), and cobalt(Co) and the like. For example, M can be Ga, Ga and Al, Ga and Fe, Gaand Ni, Ga and Mn, Ga and Co, or the like. Note that above compositionis obtained by a crystal structure and only one example.

In this embodiment, the oxide semiconductor layer is formed by asputtering method with use of an In—Ga—Zn—O-based metal oxide target.

In forming the oxide semiconductor layer, the substrate is held in atreatment chamber that is maintained at reduced pressure and thesubstrate temperature is preferably set to a temperature higher than orequal to 100° C. and lower than or equal to 600° C., and more preferablya temperature higher than or equal to 200° C. and lower than or equal to400° C. Here, the oxide semiconductor layer is formed while thesubstrate heated, so that concentration of impurities in the oxidesemiconductor layer can be reduced, and damage to the oxidesemiconductor layer due to sputtering can be reduced.

A preferable atmosphere for formation of the oxide semiconductor layeris a rare gas (typically argon) atmosphere, an oxygen atmosphere, or amixed atmosphere of a rare gas (typically argon) and oxygen in whichimpurities such as hydrogen, water, a hydroxyl group, and a hydride arereduced sufficiently. Specifically, it is preferable to use ahigh-purity gas atmosphere, for example, from which an impurity such ashydrogen, water, a hydroxyl group, or hydride is removed so that theconcentration is decreased to 1 ppm or lower (preferably 10 ppb orlower).

Here, in order to remove residual moisture from the chamber, anadsorption-type vacuum pump is preferably used. For example, a cryopump,an ion pump, or a titanium sublimation pump can be used. As anexhaustion unit, a turbo molecular pump to which a cold trap is addedmay be used. In the deposition chamber that is evacuated with thecryopump, a hydrogen atom and a compound containing a hydrogen atom suchas water (H₂O) (and preferably also a compound containing a carbonatom), for example, are removed, whereby the impurity concentration ofthe oxide semiconductor layer formed in the deposition chamber can bereduced.

The oxide semiconductor layer is formed to have a thickness greater thanor equal to 2 nm and less than or equal to 200 nm, preferably greaterthan or equal to 5 nm and less than or equal to 30 nm. Note that anappropriate thickness differs depending on an oxide semiconductormaterial, and the thickness is set as appropriate depending on thematerial to be used.

In addition, when a pulsed direct-current (DC) power source is used information of the oxide semiconductor layer, dust (powder or flake-likesubstances formed at the time of deposition) can be reduced and thethickness can be uniform.

Note that the sputtering conditions for depositing the oxidesemiconductor layer can be as follows: the distance between thesubstrate and the target is 170 mm, the pressure is 0.4 Pa, the directcurrent (DC) power is 0.5 kW, and the atmosphere is an oxygen atmosphere(the proportion of the oxygen flow is 100%).

Note that before the oxide semiconductor layer is formed by sputtering,dust attached to a surface of the insulating layer 138 is preferablyremoved by reverse sputtering where plasma is generated by theintroduction of an argon gas. Here, the reverse sputtering is a methodby which ions collide with a surface to be processed so that the surfaceis modified, in contrast to normal sputtering by which ions collide witha sputtering target. An example of a method for making ions collide witha surface to be processed is a method in which high-frequency voltage isapplied to the surface in an argon atmosphere so that plasma isgenerated near a substrate. Note that a nitrogen atmosphere, a heliumatmosphere, an oxygen atmosphere, or the like may be used instead of anargon atmosphere.

As an etching method for the oxide semiconductor layer, either dryetching or wet etching may be employed. It is needless to say that dryetching and wet etching can be used in combination. The etchingconditions (e.g., an etching gas or an etching solution, etching time,and temperature) may be set as appropriate depending on the material sothat the oxide semiconductor layer can be etched into a desired shape.

An example of an etching gas used for dry etching is a gas containingchlorine (a chlorine-based gas such as chlorine (Cl₂), boron trichloride(BCl₃), silicon tetrachloride (SiCl₄), or carbon tetrachloride (CCl₄)).Moreover, a gas containing fluorine (a fluorine-based gas such as carbontetrafluoride (CF₄), sulfur hexafluoride (SF₆), nitrogen trifluoride(NF₃), or trifluoromethane (CHF₃)), hydrogen bromide (HBr), oxygen (O₂),any of these gases to which a rare gas such as helium (He) or argon (Ar)is added, or the like may be used.

As the dry etching method, a parallel plate RIE (reactive ion etching)method or an ICP (inductively coupled plasma) etching method can beused. In order to etch the oxide semiconductor layer into a desiredshape, etching conditions (e.g., the amount of electric power applied toa coiled electrode, the amount of electric power applied to an electrodeon the substrate side, and the electrode temperature on the substrateside) are set as appropriate.

As an etchant used for wet etching, a solution obtained by mixingphosphoric acid, acetic acid, and nitric acid, an ammonia peroxidemixture (hydrogen peroxide water at 31 wt %:ammonia water at 28 wt%:water=5:2:2), or the like can be used. An etchant such as ITO07N(produced by KANTO CHEMICAL CO., INC.) may also be used.

Then, first heat treatment is preferably performed on the oxidesemiconductor layer. By this first heat treatment, impurities such ashydrogen in the oxide semiconductor layer can be removed. Note that inthe case where the first heat treatment is performed after etching,there is an advantage that time for etching can be shortened even whenwet etching is used. The temperature of the first heat treatment is setto a temperature higher than or equal to 300° C. and lower than or equalto 750° C., preferably higher than or equal to 400° C. and lower than orequal to 700° C. For example, the substrate is introduced into anelectric furnace in which a resistance heating element or the like isused and the oxide semiconductor layer 140 is subjected to heattreatment at 450° C. for one hour in a nitrogen atmosphere. The oxidesemiconductor layer 140 is not exposed to the air during the heattreatment so that entry of water and hydrogen (including moisture or thelike) can be prevented. In addition, the temperature of the first heattreatment is preferably determined in consideration of heat resistanceof electrodes, wirings, or the like of the transistor 160 positioned inthe lower layer.

The heat treatment apparatus is not limited to the electric furnace andcan be an apparatus for heating an object by thermal radiation orthermal conduction from a medium such as a heated gas. For example, anRTA (rapid thermal anneal) apparatus such as a GRTA (gas rapid thermalanneal) apparatus or an LRTA (lamp rapid thermal anneal) apparatus canbe used. An LRTA apparatus is an apparatus for heating an object to beprocessed by radiation of light (an electromagnetic wave) emitted from alamp such as a halogen lamp, a metal halide lamp, a xenon arc lamp, acarbon arc lamp, a high pressure sodium lamp, or a high pressure mercurylamp. A GRTA apparatus is an apparatus for performing heat treatmentusing a high-temperature gas. As the gas, an inert gas that does notreact with an object by heat treatment, for example, nitrogen or a raregas such as argon is used.

For example, as the first heat treatment, a GRTA process may beperformed as follows. The substrate is put in an inert gas that has beenheated to a high temperature of 650° C. to 700° C., heated for severalminutes, and taken out of the inert gas. The GRTA process enableshigh-temperature heat treatment for a short time. In addition, since thefirst heat treatment is performed for a short time, a substrate with lowheat resistance, such as a glass substrate, can be used even under atemperature condition which exceeds the strain point of the substrate.

Note that the first heat treatment is preferably performed in allatmosphere which contains nitrogen or a rare gas (e.g., helium, neon, orargon) as its main component and does not contain hydrogen, water, orthe like. For example, the purity of nitrogen or a rare gas such ashelium, neon, or argon introduced into a heat treatment apparatus isgreater than or equal to 6 N (99.9999%), preferably greater than orequal to 7 N (99.99999%) (i.e., the impurity concentration is less thanor equal to 1 ppm, preferably less than or equal to 0.1 ppm).

In some cases, the oxide semiconductor layer might be crystallized to bea semiconductor layer containing a crystal component depending on theconditions of the first heat treatment or the material of the oxidesemiconductor layer. Further, depending on the conditions of the firstheat treatment or the material of the oxide semiconductor layer, theoxide semiconductor layer may be an amorphous oxide semiconductor layercontaining no crystalline component.

In addition, electric characteristics of the oxide semiconductor layercan be changed by providing a crystal layer over the amorphous surfaceof the oxide semiconductor layer. For example, by providing a crystallayer having electrical anisotropy in which crystal grains are aligned,the electric characteristics of the oxide semiconductor layer can bechanged.

The first heat treatment for the oxide semiconductor layer 140 can beperformed on the oxide semiconductor layer that has not yet beenprocessed into the island-shaped oxide semiconductor layer 140. In thatcase, after the first heat treatment, the substrate is taken out of theheating apparatus and a photolithography step is performed.

Note that the above-described heat treatment can be referred to asdehydrogenation treatment (dehydration treatment), or the like becauseof its effect of dehydrogenation (dehydration) on the oxidesemiconductor layer 140. Such treatment can be performed in any oftimings such as after the oxide semiconductor layer is formed, after aninsulating layer (the gate insulating layer or the like) is formed overthe oxide semiconductor layer 140, or after the gate electrode isformed. Such treatment may be conducted once or plural times.

In addition, in the case where the oxide semiconductor layer whosehydrogen is sufficiently reduced can be obtained by a method in which anatmosphere relating to formation of the oxide semiconductor layer iscontrolled or the like, the first heat treatment can be omitted.

Note that plasma treatment may be performed with the use of a gas suchas N₂O, N₂, or Ar after the above step. The plasma treatment can removewater or the like that adheres to an exposed surface of the oxidesemiconductor layer. In addition, plasma treatment may be performedusing a gas containing oxygen, such as a mixed gas of oxygen and argon,or the like. In this manner, the oxide semiconductor layer is suppliedwith oxygen and defect levels in the energy gap resulted from oxygendeficiency can be reduced.

Next, the insulating layer 144 is formed above the source or drainelectrode 142 a, the source or drain electrode 142 b, the oxidesemiconductor layer 140, and the like, and openings are formed in partof a region where the gate electrode is formed and part of a regionwhere the electrode of the capacitor is formed. Then, the gateinsulating layer 146 is formed to cover a region including the openings.After that, the gate electrode 148 a and the electrode 1486 are formed(see FIG. 5D). The openings in the insulating layer 144 can be formed bya method such as etching using a mask. The gate electrode 148 a and theelectrode 148 b can be formed in such a manner that a conductive layeris formed to cover the gate insulating layer 146 and then etchedselectively.

The insulating layer 144 and the gate insulating layer 146 can be formedby a CVD method, a sputtering method, or the like. In addition, theinsulating layer 144 and the gate insulating layer 146 are preferablyformed to containing silicon oxide, silicon nitride, silicon oxynitride,aluminum oxide, hafnium oxide, tantalum oxide, or the like. Theinsulating layer 144 and the gate insulating layer 146 may have asingle-layer structure or a stacked-layer structure. There is noparticular limitation on the thicknesses of the insulating layer 144 andthe gate insulating layer 146, but each of them can be formed to athickness greater than or equal to 10 nm and less than or equal to 500um, for example. Note that the insulating layer 144 is provided toreduce capacitance which is generated when electrodes overlap with eachother or the like. For example, when the insulating layer 144 is formed,capacitance generated by the source or drain electrode 142 a or the likewith the gate electrode 148 a can be reduced.

The insulating layer 144 and the gate insulating layer 146 arepreferably formed by a method in which an impurity such as hydrogen orwater does not easily enter the insulating layer 144 and the gateinsulating layer 146. This is because when the insulating layer 144 andthe gate insulating layer 146 contain hydrogen, intrusion of hydrogen tothe oxide semiconductor layer, extraction of oxygen from the oxidesemiconductor layer, or the like may occur.

For example, in the case where the insulating layer 144 and the gateinsulating layer 146 are formed by a sputtering method, a high-puritygas in which the concentration of an impurity such as hydrogen, water, ahydroxyl group, or hydride is reduced to approximately 1 ppm (preferablyapproximately 10 ppb) is used as a sputtering gas. In addition, residualmoisture in the treatment chamber is preferably removed.

Note that an oxide semiconductor that becomes intrinsic by removal ofimpurities (a highly purified oxide semiconductor) as described in thisembodiment is quite susceptible to the interface level and the interfacecharge; therefore, when such an oxide semiconductor is used for theoxide semiconductor layer, the interface with the gate insulating layeris important. Therefore, the gate insulating layer 146 which is incontact with the highly-purified oxide semiconductor needs high quality.

For example, the gate insulating layer 146 is preferably formed by ahigh-density plasma CVD method using a microwave (the frequency is 2.45GHz) because the gate insulating layer 146 can be dense and have highwithstand voltage and high quality. This is because when thehighly-purified oxide semiconductor is closely in contact with thehigh-quality gate insulating film, the interface state can be reducedand interface properties can be favorable.

It is needless to say that, even when a highly-purified oxidesemiconductor layer is used, another method such as a sputtering methodor a plasma CVD method can be employed as long as a good-qualityinsulating layer can be formed as the gate insulating layer. Moreover,it is possible to use an insulating layer whose quality and interfacecharacteristics are improved with heat treatment performed after theformation of the insulating layer. In any case, the gate insulatinglayer 146 with good film-quality in which interface state density of thegate insulating layer 146 with the oxide semiconductor layer can bereduced may be formed.

In this embodiment, insulating layers containing silicon oxide whichserve as the insulating layer 144 and the gate insulating layer 146 areformed by a sputtering method.

After the insulating layer 144 or the gate insulating layer 146 isformed, second heat treatment (preferably at a temperature higher thanor equal to 200° C. and lower than or equal to 400° C., for example,higher than or equal to 250° C. and lower than or equal to 350° C.) inan inert gas atmosphere or an oxygen atmosphere is preferably performed.For example, the second heat treatment is performed at 250° C. for onehour in a nitrogen atmosphere. The second heat treatment can reducevariation in electric characteristics of the transistor. Further, by thesecond heat treatment, oxygen can be supplied to the oxide semiconductorfrom the insulating layer containing oxygen and defects levels in theenergy gap caused by oxygen deficiency can be reduced. Withoutlimitation to the above atmosphere, the atmosphere of the heat treatmentmay be an air atmosphere, or the like. However, in this case, anatmosphere in which hydrogen, water, and the like are removed ispreferably employed in order that hydrogen is not mixed to the oxidesemiconductor layer. In addition, the second heat treatment is not arequired step and therefore may be omitted.

The conductive layer to be the gate electrode 148 a and the electrode148 b can be formed by a PVD method typified by a sputtering method or aCVD method such as a plasma CVD method. The details are similar to thoseof the source or drain electrode 142 a or the like; thus, thedescription thereof can be referred to.

Either dry etching or wet etching may be used as the etching for formingthe openings in the insulating layer 144 or the etching for forming thegate electrode 148 a or the like. It is needless to say that dry etchingand wet etching can be used in combination. The etching conditions(e.g., an etching gas or an etching solution, etching time, andtemperature) may be set as appropriate depending on the material so thata desired shape can be obtained.

Next, the protective insulating layer 150 and the interlayer insulatinglayer 152 are formed (see FIG. 5E).

The protective insulating layer 150 and the interlayer insulating layer152 can be formed by a PVD method, a CVD method, or the like. Theprotective insulating layer 150 and the interlayer insulating layer 152can be formed using an inorganic insulating material such as siliconoxide, silicon nitride oxide, silicon nitride, hafnium oxide, aluminumoxide, or tantalum oxide.

Note that since the protective insulating layer 150 is positionedrelatively near the oxide semiconductor layer 140, the protectiveinsulating layer 150 is preferably formed by a method by whichimpurities such as hydrogen and water are not easily mixed, such as asputtering method.

Further, the interlayer insulating layer 152 is preferably formed so asto have a planarized surface. This is because an electrode, a wiring, orthe like can be favorably formed over the interlayer insulating layer152 when the interlayer insulating layer 152 is formed so as to have aflat surface.

Note that the protective insulating layer 150 or the interlayerinsulating layer 152 is not a required component and may be omitted asappropriate.

As described above, the transistor 162 including an oxide semiconductorand the capacitor 164 are completed (see FIG. 5E).

Off current is extremely small in the transistor 162 including an oxidesemiconductor which is manufactured by the above method. For example,the carrier density of the oxide semiconductor which is intrinsic(i-type) enough is, for example, less than 1×10¹²/cm³, or preferablyless than 1.45×100/cm³, and the off current of the transistor is, forexample, less than or equal to 1×10⁻¹³ A in the case where a drainvoltage V_(d) is +1 V or +10 V and a gate voltage V_(g) ranges from −5 Vto −20 V. Therefore, the data retention period of the semiconductordevice can be sufficiently ensured. In addition, in the case where anoxide semiconductor which is sufficiently intrinsic is used, leakagecurrent at room temperature can be reduced to approximately 1×10⁻²⁰ A(10 zA (zeptoampere) to 1×10⁻¹⁹ A (100 zA). In other words, leakagecurrent can be substantially 0. With the use of such an oxidesemiconductor, the semiconductor device in which the data retentionperiod is sufficiently ensured can be provided.

The capacitor 164 is also provided, which facilitates retention ofcharge given to the gate electrode of the transistor 160 and reading ofstored contents. In particular, the capacitor 164 can be formed withoutincrease of steps by the method described in this embodiment, which isadvantageous in view of cost cut.

Note that the semiconductor device having a stacked-layer (two-layer)structure of the transistor including a material other than an oxidesemiconductor and the transistor including an oxide semiconductor isdescribed in this embodiment. However, a structure used for thedisclosed invention is not limited to the stacked-layer structure. Asingle-layer structure or a stacked-layer structure of three layers ormore may be employed.

In addition, positions or connection relations of electrodes (wirings),insulating layers, semiconductor layers, and the like; parameters suchas a width of a wiring, a channel width, a channel length; or otherconditions can be changed as appropriate depending on functions neededfor a semiconductor integrated circuit. For example, structures ofelectrodes, wirings, or the like in the case of a semiconductor devicewith a single-layer structure are largely different from those in thecase of a semiconductor device with a stacked-layer structure.

The structures, methods, and the like described in this embodiment canbe combined as appropriate with any of the structures, methods, and thelike described in the other embodiments.

Embodiment 2

In this embodiment, a semiconductor device which is different from thatdescribed in the above embodiment and a method for manufacturing asemiconductor device are described with reference to FIGS. 6A and 6B andFIGS. 7A to 7E. Note that the structure and the manufacturing process ofthe semiconductor device in this embodiment have a lot in common withthose in Embodiment 1. Therefore, in the following description, repeateddescription of the same portions is omitted, and different points aredescribed in detail.

<Planar Structure and Cross-Sectional Structure of Semiconductor Device>

FIGS. 6A and 6B illustrate an example of a structure of thesemiconductor device. FIGS. 6A and 6B illustrate a cross section of thesemiconductor device and a plan view thereof, respectively. Here, FIG.6A corresponds to a cross section taken along line A3-A4 and line B3-B4of FIG. 6B. In the semiconductor device illustrated in FIGS. 6A and 6B,in a similar manner to FIGS. 1A and 1B, a transistor 160 including amaterial other than an oxide semiconductor is included in a lowerportion, and a transistor 162 including an oxide semiconductor and acapacitor 164 are included in an upper portion. Since the semiconductordevice described in this embodiment is not provided with an insulatinglayer 144, the manufacturing process is simplified and manufacturingcost is lowered as compared to the semiconductor device illustrated inFIG. 1A. Note that the insulating layer 144 may be provided in order toreduce capacitance due to a gate electrode 148 a or the like.

The transistor 162 illustrated in FIG. 6A includes an oxidesemiconductor layer 140 provided over an insulating layer 138; a sourceor drain electrode 142 a and a source or drain electrode 142 b which areelectrically connected to the oxide semiconductor layer 140; a gateinsulating layer 146 covering the source or drain electrode 142 a, thesource or drain electrode 142 b, and the oxide semiconductor layer 140;and the gate electrode 148 a overlapping with the oxide semiconductorlayer 140 over the gate insulating layer 146. Note that the transistor162 illustrated in FIG. 6A is a top-gate transistor and can be referredto a top-gate top-contact transistor because the oxide semiconductorlayer 140 and the source or drain electrode 142 a or the like areconnected to each other in a region including a top surface of the oxidesemiconductor layer 140.

<Method for Manufacturing Semiconductor Device>

Next, an example of a method for manufacturing the semiconductor deviceis described. In the following description, a method for manufacturingthe transistor 162 in the upper portion is described with reference toFIGS. 7A to 7E. Note that since a manufacturing method of the transistor160 in the lower portion is the same as the manufacturing methodillustrated in FIG. 4, description thereof is omitted.

First, the insulating layer 138 is formed over an interlayer insulatinglayer 128, a source or drain electrode 130 a, a source or drainelectrode 130 b, and an electrode 130 c. Then, openings reaching thesource or drain electrode 130 a, the source or drain electrode 130 b,and the electrode 130 c are formed in the insulating layer 138 (see FIG.7A). Description of a material and a formation method of the insulatinglayer 138 is omitted because FIG. 5A can be referred to. In addition,the openings can be formed by a method such as etching with the use of amask.

Next, an oxide semiconductor layer is formed over the insulating layer138 and processed by a method such as etching with the use of a mask, sothat the island-shaped oxide semiconductor layer 140 is formed (see FIG.7B). Description of a material and a formation method of theisland-shaped oxide semiconductor layer 140 is omitted because FIG. 5Ccan be referred to.

Next, a conductive layer is formed to cover the insulating layer 138,the openings provided in the insulating layer 138, and the island-shapedoxide semiconductor layer 140, and then processed by a method such asetching with the use of a mask, so that the source or drain electrode142 a and the source or drain electrode 142 b which are in contact withthe oxide semiconductor layer 140, an electrode 142 c, and an electrode142 d are formed. Then, the gate insulating layer 146 is formed to coverthe source or drain electrode 142 a, the source or drain electrode 142b, the electrode 142 c, and the electrode 142 d (see FIG. 7C).Description of a material and a formation method of the source or drainelectrode 142 a, the source or drain electrode 142 b, the electrode 142c, and the electrode 142 d is omitted because FIG. 5B can be referredto. In addition, description of a material and a formation method of thegate insulating layer 146 is omitted because FIG. 5D can be referred to.

Then, a conductive layer is formed over the gate insulating layer 146and processed by a method such as etching with the use of a mask, sothat the gate electrode 148 a and an electrode 148 b are formed (seeFIG. 7D). Description of a material and a formation method of the gateelectrode 148 a and the electrode 148 b is omitted because FIG. 5D canbe referred to.

Next, a protective insulating layer 150 and an interlayer insulatinglayer 152 are formed to cover the gate insulating layer 146, the gateelectrode 148 a, and the electrode 148 b (see FIG. 7E). Description ofmaterials and formation methods of the protective insulating layer 150and the interlayer insulating layer 152 is omitted because FIG. 5E canbe referred to.

Through the above steps, the semiconductor device illustrated in FIGS.6A and 6B can be manufactured.

Embodiment 3

In this embodiment, examples of a circuit configuration, operation, andthe like of a semiconductor device which is formed using a plurality ofsemiconductor devices illustrated in Embodiment 1 are described withreference to FIGS. 8A and 8B and FIGS. 9A and 9B.

<Circuit Configuration and Operation of Semiconductor Device>

FIGS. 8A and 8B are examples of circuit diagrams of semiconductordevices each including a plurality of semiconductor devices (hereinafteralso referred to as memory cells 190) illustrated in FIG. 3A1. FIG. 8Ais a circuit diagram of a NAND semiconductor device in which the memorycells 190 are connected in series, and FIG. 8B is a circuit diagram of aNOR semiconductor device in which the memory cells 190 are connected inparallel.

The semiconductor device in FIG. 8A includes a source line SL, a bitline BL, a first signal lines S1, a plurality of second signal lines S2,a plurality of word lines WL, and the plurality of memory cells 190. Ineach of the memory cells 190, a gate electrode of the transistor 160,one of a source electrode and a drain electrode of the transistor 162,and one of electrodes of the capacitor 164 are electrically connected toone another. The first signal line S1 and the other of the sourceelectrode and the drain electrode of the transistor 162 are electricallyconnected to each other, and the second signal line S2 and a gateelectrode of the transistor 162 are electrically connected to eachother. The word line WL and the other of the electrodes of the capacitor164 are electrically connected to each other.

Further, the source electrode of the transistor 160 included in thememory cell 190 is electrically connected to the drain electrode of thetransistor 160 in the adjacent memory cell 190. The drain electrode ofthe transistor 160 included in the memory cell 190 is electricallyconnected to the source electrode of the transistor 160 in the adjacentmemory cell 190. Note that the drain electrode of the transistor 160included in the memory cell 190 of the plurality of memory cellsconnected in series, which is provided at one of ends, is electricallyconnected to the bit line. The source electrode of the transistor 160included in the memory cell 190 of the plurality of memory cellsconnected in series, which is provided at the other end, is electricallyconnected to the source line SL. Note that in FIG. 8A, one source lineSL and one bit line BL are provided in the semiconductor device;however, an embodiment of the present invention is not limited to this.A plurality of source lines SL and a plurality of bit lines BL may beprovided.

In the semiconductor device in FIG. 8A, writing operation and readingoperation are performed in each row. The writing operation is performedas follows. A potential at which the transistor 162 is turned on issupplied to the second signal line S2 of a row where writing is to beperformed, so that the transistor 162 of the row where writing is to beperformed is turned on. Accordingly, a potential of the first signalline S1 is supplied to the gate electrode of the transistor 160 of thespecified row, so that predetermined charge is given to the gateelectrode. Thus, data can be written to the memory cell of the specifiedrow.

Further, the reading operation is performed as follows. First, apotential at which the transistor 160 is turned on regardless of chargesof the gate electrode of the transistor 160 is supplied to the wordlines WL of rows other than a row where reading is to be performed, sothat the transistors 160 of the rows other than the row where reading isto be performed are turned on. Then, a constant potential is suppliedthe source line SL, and the bit line BL is connected to a readingcircuit (not shown). Here, the plurality of transistors 160 between thesource line SL and the bit line BL are on except the transistors 160 ofthe row where reading is to be performed; therefore, conductance betweenthe source line SL and the bit line BL is determined by a state of thetransistors 160 of the row where reading is to be performed. That is, apotential of the bit line BL which is read out by the reading circuitdepends on charge in the gate electrodes of the transistors 160 of therow where reading is to be performed. In such a manner, the readingcircuit can read data from the memory cell in the specified row.

The semiconductor device in FIG. 8B includes a plurality of source linesSL, a plurality of bit lines BL, a plurality of first signal lines S1, aplurality of second signal lines S2, a plurality of word lines WL, and aplurality of the memory cells 190. A gate electrode of the transistor160, one of a source electrode and a drain electrode of the transistor162, and one of electrodes of the capacitor 164 are electricallyconnected to one another. The source line SL and a source electrode ofthe transistor 160 are electrically connected to each other. The bitline BL and a drain electrode of the transistor 160 are electricallyconnected to each other. The first signal line S1 and the other of thesource electrode and the drain electrode of the transistor 162 areelectrically connected to each other, and the second signal line S2 anda gate electrode of the transistor 162 are electrically connected toeach other. The word line WL and the other of the electrodes of thecapacitor 164 are electrically connected to each other.

In the semiconductor device in FIG. 8B, writing operation and readingoperation are performed in each row. The writing operation is performedin a manner similar to that of the semiconductor device in FIG. 8A. Thereading operation is performed as follows. First, a potential at whichan on state or an off state of the transistor 160 is selected dependingon charge stored in the gate electrode of the transistor 160 is suppliedto the word line WL in a row where reading is performed. Then, aconstant potential is supplied to the source line SL, and the bit lineBL is connected to the reading circuit (not shown). The transistors 160in rows which are not selected are in an off state. Here, conductancebetween the source line SL and the bit line BL is determined by a stateof the transistors 160 of the row where reading is to be performed. Thatis, a potential of the bit line BL which is read out by the readingcircuit depends on charge in the gate electrodes of the transistors 160of the row where reading is to be performed. In such a manner, thereading circuit can read data from the memory cell in specified row.

In the semiconductor devices illustrated in FIGS. 8A and 8B, thetransistor 160 including a material other than an oxide semiconductorcan operate at sufficiently high speed, and therefore, reading of storedcontents or the like can be performed at high speed. Moreover, thetransistor 162 including an oxide semiconductor has extremely low offcurrent. For that reason, a potential of the gate electrode of thetransistor 160 can be retained for an extremely long time by turning offthe transistor 162. By providing the capacitor 164, retention of chargegiven to the gate electrode of the transistor 160 and reading of storedcontents can be performed easily.

Meanwhile, as for the semiconductor device including the plurality ofmemory cells described above, reduction of an area occupied by eachmemory cell becomes an issue in order to suppress cost per storagecapacity. In order to solve the issue, for example, in the NANDsemiconductor device illustrated in FIG. 8A, each of the transistors 160connected in series is formed to have such a structure as illustrated ina cross-sectional view of FIG. 9A, whereby an area occupied by eachmemory cell can be reduced. Note that FIG. 9A corresponds to a crosssection taken along lines C1-C2 and D1-D2 in FIG. 9B.

In the semiconductor device illustrated in FIG. 9A, the transistor 160provided over a substrate 100 is connected to the adjacent transistor160 via a high-concentration impurity region 120 (also simply referredto as an impurity region) and a metal compound region 124. That is, thehigh-concentration impurity region 120 and the metal compound region 124which are provided between the transistors 160 function as a sourceregion of one of the transistors 160 and a drain region of the other ofthe transistors 160.

In addition, an interlayer insulating layer 126 and an interlayerinsulating layer 128 are provided to cover the transistor 160. Inaddition, at an end of the plurality of transistors 160 connected toeach other in series, an electrode 192 which is electrically connectedto the metal compound region 124 through an opening formed in theinterlayer insulating layer 126 and the interlayer insulating layer 128is formed.

Here, since the transistor 160 has almost the same structure as thetransistor 160 illustrated in FIGS. 1A and 1B of Embodiment 1,description of FIGS. 1A and 1B can be referred to for description of thetransistor 160 illustrated in FIGS. 9A and 9B. Note that in thisembodiment, in order to obtain high integration of the transistor 160,sidewall insulating layers 118 illustrated in FIGS. 1A and 1B are notprovided.

In addition, the structure illustrated in FIG. 9A can be employed fornot only the NAND semiconductor device illustrated in FIG. 8A but alsothe NOR semiconductor device illustrated in FIG. 8B. For example, inFIG. 8B, memory cells in adjacent rows may be arranged symmetrically,and the transistors 160 of the memory cells in the adjacent rows may beconnected to each other via a high-concentration impurity region 120 anda metal compound region 124. In this case, at least two transistors 160are connected to each other via the high-concentration impurity region120 and the metal compound region 124.

When the plurality of the transistors 160 are connected to each other insuch a manner, high integration of the transistors 160 and the memorycells 190 can be obtained. Accordingly, cost per storage capacity of thesemiconductor device can be suppressed.

The structures, methods, and the like described in this embodiment canbe combined with any of structures, methods, and the like of the otherembodiments as appropriate.

Embodiment 4

Next, modified examples of a semiconductor device are illustrated inFIGS. 10A and 10B.

A semiconductor device illustrated in FIG. 10A is a modified example ofthe semiconductor device illustrated in FIG. 1A.

The structure illustrated in FIG. 10A is different from the structureillustrated in FIG. 1A in that an electrode 130 c is electricallyconnected to a metal compound region provided over a substrate 100. Inother words, a source or drain electrode 142 a and the metal compoundregion are electrically connected to each other in FIG. 10A, whereas thesource or drain electrode 142 a and a gate electrode 110 areelectrically connected to each other in the structure illustrated inFIG. 1A.

With the structure illustrated in FIG. 10A, a semiconductor devicehaving a circuit configuration which is different from that of thesemiconductor device in any of the above embodiments can be obtained.

A semiconductor device illustrated in FIG. 10B is a modified example ofthe semiconductor device illustrated in FIG. 6A.

The structure illustrated in FIG. 10B is different from the structureillustrated in FIG. 6A in that the electrode 130 c and a metal compoundregion provided over the substrate 100 are electrically connected toeach other. In other words, the source or drain electrode 142 a and themetal compound region are electrically connected to each other in FIG.10B, whereas the source or drain electrode 142 a and the gate electrode110 are electrically connected to each other in the structureillustrated in FIG. 6A.

With the structure illustrated in FIG. 10B, a semiconductor devicehaving a circuit configuration which is different from that of thesemiconductor device in any of the above embodiments can be obtained.

The structures, methods, and the like described in this embodiment canbe combined with any of structures, methods, and the like of the otherembodiments as appropriate.

Embodiment 5

Next, another example of the manufacturing method of a transistorincluding an oxide semiconductor which can be used as the transistor 162or the like in the above embodiments (such as Embodiment 1) is describedwith reference to FIGS. 11A to 11E. In this embodiment, description ismade in detail on the case where an oxide semiconductor (particularlywith an amorphous structure) which is highly purified is used. Althougha top-gate transistor is used as an example in the followingdescription, the structure of the transistor is not limited thereto.

First, an insulating layer 202 is formed over a lower layer substrate200. Then, an oxide semiconductor layer 206 is formed over theinsulating layer 202 (see FIG. 11A)

For example, the lower layer substrate 200 can be a structure body belowthe interlayer insulating layer 128 of the semiconductor device in theabove embodiment (FIGS. 1A and 1B, FIGS. 6A and 6B, or the like). Forthe details thereof, the above embodiment can be referred to. It ispreferable that a surface of the lower layer substrate 200 be as flat aspossible. For example, difference in height on the surface may be lessthan or equal to 5 nm, or preferable less than or equal to 1 nm by achemical mechanical polishing method (a CMP method) or the like. Inaddition, a root-mean-square (RMS) of a surface roughness may be lessthan or equal to 2 nm, or preferable less than or equal to 0.4 nm.

The insulating layer 202 serves as a base and can be formed in a mannersimilar to that of the insulating layer 138, the insulating layer 144,or the like shown in the above embodiments. The above embodiments can bereferred to for details of the insulating layer 202. Note that it ispreferable to form the insulating layer 202 so as to contain hydrogen orwater as little as possible.

As the oxide semiconductor layer 206, any of the following oxidesemiconductors can be used: an In—Sn—Ga—Zn—O-based oxide semiconductorwhich is a four-component metal oxide; an In—Ga—Zn—O-based oxidesemiconductor, an In—Sn—Zn—O-based oxide semiconductor, anIn—Al—Zn—O-based oxide semiconductor, a Sn—Ga—Zn—O-based oxidesemiconductor, an Al—Ga—Zn—O-based oxide semiconductor, or aSn—Al—Zn—O-based oxide semiconductor which are three-component metaloxides; an In—Zn—O-based oxide semiconductor, a Sn—Zn—O-based oxidesemiconductor, an Al—Zn—O-based oxide semiconductor, a Zn—Mg—O-basedoxide semiconductor, a Sn—Mg—O-based oxide semiconductor, or anIn—Mg—O-based oxide semiconductor which are two-component metal oxides;or an In—O-based oxide semiconductor, a Sn—O-based oxide semiconductor,or a Zn—O-based oxide semiconductor.

In particular, an In—Ga—Zn—O-based oxide semiconductor material hassufficiently high resistance when there is no electric field and thus asufficiently low off current can be obtained. In addition, having highfield-effect mobility, the In—Ga—Zn—O-based oxide semiconductor materialis suitable for a semiconductor device.

A typical example of the In—Ga—Zn—O-based oxide semiconductor materialis represented by InGaO₃ (ZnO)_(m) (m>0). Another example of the oxidesemiconductor material is represented by InMO₃ (ZnO)_(m) (m>0) where Mis used instead of Ga. Here, M denotes one or more of metal elementsselected from gallium (Ga), aluminum (Al), iron (Fe), nickel (Ni),manganese (Mn), cobalt (Co), and the like. For example, M can be Ga, Gaand Al, Ga and Fe, Ga and Ni, Ga and Mn, Ga and Co, or the like. Notethat the aforementioned composition is only an example obtained from acrystalline structure.

As a target for manufacturing the oxide semiconductor layer 206 by asputtering method, a target represented by a compositional formula ofIn:Ga:Zn=1:x:y (x is greater than or equal to 0 and y is greater than orequal to 0.5 and less than or equal to 5) may be used. For example, atarget having a compositional ratio of In:Ga:Zn=1:1:1 [atomic ratio](x=1 and y=1) (i.e., In₂O₃:Ga₂O₃:ZnO=1:1:2 [molar ratio]) may also beused. In addition, a target having a compositional ratio ofIn:Ga:Zn=1:1:0.5 [atomic ratio] (x=1 and y=0.5), a target having acompositional ratio of In:Ga:Zn=1:1:2 [atomic ratio] (x=1 and y=2), or atarget having a compositional ratio of In:Ga:Zn=1:0:1 [atomic ratio](x=0 and y=1) may also be used.

The relative density of the metal oxide in the metal oxide target isgreater than or equal to 80%, preferably greater than or equal to 95%,and more preferably greater than or equal to 99.9%. The use of the metaloxide target with high relative density makes it possible to form theoxide semiconductor layer 206 having a dense structure.

In this embodiment, the oxide semiconductor layer 206 having anamorphous structure is formed by a sputtering method with the use of anIn—Ga—Zn—O-based metal oxide target.

The atmosphere in which the oxide semiconductor layer 206 is formed ispreferably a rare gas (typically argon) atmosphere, an oxygenatmosphere, or a mixed atmosphere containing a rare gas (typicallyargon) and oxygen. Specifically, it is preferable to use, for example, ahigh-purity gas atmosphere from which an impurity such as hydrogen,water, a hydroxyl group, or hydride is removed to a concentration of 1ppm or less (preferably, 10 ppb or less).

At the time of forming the oxide semiconductor layer 206, for example,the substrate is held in a treatment chamber kept under reduced pressureand the substrate is heated to a temperature higher than or equal to100° C. and lower than 550° C., preferably higher than or equal to 200°C. and lower than or equal to 400° C. Then, a sputtering gas from whichhydrogen, water, or the like is removed is introduced into the treatmentchamber while moisture in the treatment chamber is removed, whereby theoxide semiconductor layer 206 is formed using the aforementioned target.The oxide semiconductor layer 206 is formed while the substrate isheated, so that an impurity contained in the oxide semiconductor layer206 can be reduced. Moreover, damage due to sputtering can be reduced.An entrapment vacuum pump is preferably used in order to remove moistureremaining in the treatment chamber. For example, a cryopump, an ionpump, or a titanium sublimation pump can be used. Alternatively, a turbomolecular pump provided with a cold trap may also be used. Sincehydrogen, water, or the like is removed from the treatment chamberevacuated with a cryopump, the concentration of an impurity in the oxidesemiconductor layer 206 can be reduced.

The oxide semiconductor layer 206 can be formed under the followingconditions, for example: the distance between the substrate and thetarget is 170 mm; the pressure is 0.4 Pa; the direct-current (DC) poweris 0.5 kW; and the atmosphere is oxygen (the proportion of oxygen is100%), argon (the proportion of argon is 100%), or a mixed atmospherecontaining oxygen and argon. Note that it is preferable to use a pulseddirect-current (DC) power source because dust (such as powder substancesformed at the time of deposition) can be reduced and the thicknessdistribution is uniform. The thickness of the oxide semiconductor layer206 is 2 nm to 200 nm inclusive, preferably 5 nm to 30 nm inclusive.Note that the appropriate thickness of the oxide semiconductor layerdiffers depending on the oxide semiconductor material to be used, theintended purpose of a semiconductor device, or the like; therefore, thethickness may be determined in accordance with the material, theintended purpose, or the like.

Note that before the oxide semiconductor layer 206 is formed with asputtering method, reverse sputtering is preferably performed in whichplasma is generated with an argon gas introduced, so that dust on thesurface of the insulating layer 202 is removed. Here, the reversesputtering is a method in which ions collide with a surface to beprocessed so that the surface is modified, in contrast to normalsputtering in which ions collide with a sputtering target. An example ofa method for making ions collide with a surface to be processed is amethod in which a high-frequency voltage is applied to the surface to beprocessed under an argon atmosphere so that plasma is generated near asubstrate. Note that an atmosphere of nitrogen, helium, oxygen, or thelike may be used instead of an argon atmosphere.

Next, the oxide semiconductor layer 206 is processed with a method suchas etching using a mask, whereby an island-shaped oxide semiconductorlayer 206 a is formed.

As an etching method for the oxide semiconductor layer 206, either dryetching or wet etching may be employed. It is needless to say that dryetching and wet etching can be used in combination. The etchingconditions (e.g., an etching gas or an etchant, etching time, andtemperature) are set as appropriate depending on the material so thatthe oxide semiconductor layer can be etched into a desired shape. Theoxide semiconductor layer 206 can be etched in a manner similar to thatof the oxide semiconductor layer shown in the above embodiments. Theabove embodiments can be referred to for details of the etchingconditions or the like.

After that, heat treatment (first heat treatment) is preferablyperformed on the oxide semiconductor layer 206 a. Through the first heattreatment, excess hydrogen (including water and hydroxyl groups) in theoxide semiconductor layer 206 a can be removed, the structure of theoxide semiconductor layer can be aligned, and a defect level of theenergy gap in the oxide semiconductor layer 206 a can be reduced. Thefirst heat treatment is performed at a temperature higher than or equalto 300° C. and lower than 550° C., or higher than or equal to 400° C.and lower than or equal to 500° C., for example. Note that in the casewhere the heat treatment is performed after etching, there is anadvantage that time for etching can be shortened even when wet etchingis used.

The heat treatment can be performed in such a manner that, for example,the lower layer substrate 200 is introduced into an electric furnaceusing a resistance heating element or the like, and then heated under anitrogen atmosphere at 450° C. for one hour. The oxide semiconductorlayer 206 a is not exposed to the air during the heat treatment so thatthe entry of water or hydrogen can be prevented.

The heat treatment apparatus is not limited to the electric furnace andcan be an apparatus for heating an object to be processed by thermalconduction or thermal radiation from a medium such as a heated gas. Forexample, a rapid thermal annealing (RTA) apparatus such as a gas rapidthermal annealing (GRTA) apparatus or a lamp rapid thermal annealing(LRTA) apparatus can be used. An LRTA apparatus is an apparatus forheating an object to be processed by radiation of light (anelectromagnetic wave) emitted from a lamp such as a halogen lamp, ametal halide lamp, a xenon arc lamp, a carbon arc lamp, a high-pressuresodium lamp, or a high-pressure mercury lamp. A GRTA apparatus is anapparatus for performing heat treatment using a high-temperature gas. Asthe gas, an inert gas which does not react with an object to beprocessed by heat treatment, for example, nitrogen or a rare gas such asargon is used.

For example, as the first heat treatment, a GRTA process may beperformed as follows. The substrate is put in an inert gas atmospherewhich is heated, heated for several minutes, and taken out of the inertgas atmosphere. The GRTA process enables high-temperature heat treatmentfor a short time. Moreover, the GRTA process can be employed even whenthe temperature exceeds the upper temperature limit of the substratebecause it is heat treatment for a short time. Note that the inert gasmay be changed during the process to a gas including oxygen. This isbecause defect levels in the energy gap caused by oxygen deficiency canbe reduced by performing the first heat treatment under an atmospherecontaining oxygen.

Note that as the inert gas atmosphere, it is preferable to employ anatmosphere that contains nitrogen or a rare gas (e.g., helium, neon, orargon) as its main component and that does not contain water, hydrogen,or the like. For example, the purity of nitrogen or a rare gas such ashelium, neon, or argon introduced into the heat treatment apparatus isgreater than or equal to 6 N (99.9999%), preferably greater than orequal to 7 N (99.99999%) (i.e., the impurity concentration is less thanor equal to 1 ppm, preferably less than or equal to 0.1 ppm).

In any case, when the impurity is reduced through the first heattreatment to form the i-type or substantially i-type oxide semiconductorlayer 206 a, a transistor with excellent characteristics can berealized.

Note that the first heat treatment can also be performed on the oxidesemiconductor layer 206 that has not yet been processed into theisland-shaped oxide semiconductor layer 206 a. In that case, after thefirst heat treatment, the bottom substrate 200 is taken out of theheating apparatus and a photolithography step is performed.

The first heat treatment, which has an effect of removing hydrogen orwater, can also be referred to as dehydration treatment, dehydrogenationtreatment, or the like. The dehydration treatment or dehydrogenationtreatment can be performed, for example, after the oxide semiconductorlayer is formed, or after a source or drain electrode is stacked overthe oxide semiconductor layer 206 a. Such dehydration treatment ordehydrogenation treatment may be performed once or plural times.

Next, a conductive layer is formed to be in contact with the oxidesemiconductor layer 206 a. Then, a source or drain electrode 208 a and asource or drain electrode 208 b are formed by selectively etching theconductive layer (see FIG. 11B). This step is similar to the step forforming the source or drain electrode 142 a and the like described inthe above embodiments. The above embodiments can be referred to fordetails of the step.

Next, a gate insulating layer 212 in contact with part of the oxidesemiconductor layer 206 a is formed (see FIG. 11C). The description ofthe insulating layer 138 in the above embodiments can be referred to fordetails of the gate insulating layer 212.

After the gate insulating layer 212 is formed, second heat treatment ispreferably performed under an inert gas atmosphere or an oxygenatmosphere. The heat treatment is performed at a temperature higher thanor equal to 200° C. and lower than or equal to 450° C., preferablyhigher than or equal to 250° C. and lower than or equal to 350° C. Forexample, the heat treatment may be performed at 250° C. for one hourunder a nitrogen atmosphere. The second heat treatment can reducevariation in electric characteristics of the transistor. In the casewhere the gate insulating layer 212 contains oxygen, by supplying oxygento the oxide semiconductor layer 206 a to make up oxygen deficiency ofthe oxide semiconductor layer 206 a, an i-type (intrinsic) orsubstantially i-type oxide semiconductor layer can also be formed.

Note that although the second heat treatment is performed in thisembodiment after the gate insulating layer 212 is formed, the timing ofthe second heat treatment is not limited thereto.

Next, a gate electrode 214 is formed over the gate insulating layer 212in a region overlapping with the oxide semiconductor layer 206 a (seeFIG. 11D). The gate electrode 214 can be formed by forming a conductivelayer over the gate insulating layer 212 and then selectively patterningthe conductive layer. The description of the gate electrode 148 a in theabove embodiments can be referred to for details of the gate electrode214.

Next, an interlayer insulating layer 216 and an interlayer insulatinglayer 218 are formed over the gate insulating layer 212 and the gateelectrode 214 (see FIG. 11E). The interlayer insulating layer 216 andthe interlayer insulating layer 218 can be formed with a PVD method, aCVD method, or the like. The interlayer insulating layer 216 and theinterlayer insulating layer 218 can be formed using a material includingan inorganic insulating material such as silicon oxide, siliconoxynitride, silicon nitride, hafnium oxide, aluminum oxide, or tantalumoxide. Note that although a stacked structure of the interlayerinsulating layer 216 and the interlayer insulating layer 218 is used inthis embodiment, an embodiment of the invention disclosed herein is notlimited thereto. A single-layer structure or a stacked structureincluding three or more layers can also be used.

Note that the interlayer insulating layer 218 is preferably formed so asto have a planarized surface. This is because an electrode, a wiring, orthe like can be favorably formed over the interlayer insulating layer218 when the interlayer insulating layer 218 is formed so as to have aplanarized surface.

Through the above steps, a transistor 250 including the highly-purifiedoxide semiconductor layer 206 a is completed (see FIG. 11E).

The transistor 250 illustrated in FIG. 11E includes the following: theoxide semiconductor layer 206 a provided over the bottom substrate 200with the insulating layer 202 interposed therebetween; the source ordrain electrode 208 a and the source or drain electrode 208 belectrically connected to the oxide semiconductor layer 206 a; the gateinsulating layer 212 covering the oxide semiconductor layer 206 a, thesource or drain electrode 208 a, and the source or drain electrode 208b; the gate electrode 214 over the gate insulating layer 212; theinterlayer insulating layer 216 over the gate insulating layer 212 andthe gate electrode 214; and the interlayer insulating layer 218 over theinterlayer insulating layer 216.

In the transistor 250 described in this embodiment, the oxidesemiconductor layer 206 a is highly purified. Therefore, theconcentration of hydrogen in the oxide semiconductor layer 206 a is lessthan or equal to 5×10¹⁹ atoms/cm³, preferably less than or equal to5×100 atoms/cm³, or more preferably less than or equal to 5×10¹⁷atoms/cm³. In addition, the carrier density of the oxide semiconductorlayer 206 a is sufficiently low (e.g., less than 1×10¹²/cm³, preferablyless than 1.45×10¹⁰/cm³) as compared to that of a typical silicon wafer(approximately 1×10¹⁴/cm³). As a result of this, a sufficiently low offcurrent can be obtained. For example, in the case where a channel lengthis 10 μm, the thickness of the oxide semiconductor layer is 30 nm, and adrain voltage ranges from approximately 1 V to 10 V, off current (adrain current when a gate-source voltage is less than or equal to 0 V)is less than or equal to 1×10⁻¹³ A. In addition, off current density (avalue obtained by dividing the off current by the channel width of thetransistor) at room temperature is approximately 1×10⁻²⁰ A/μm (10 zA/μm)to 1×10⁻¹⁹ A/μm (100 zA/μm).

Note that characteristics of the above transistor can be representedusing off resistance (a resistance value when the transistor is turnedoff) or off resistivity (resistivity when the transistor is turned off)in addition to the off current or the off current density. Here, offresistance R is obtained by Ohm's law with the use of the off currentand the drain voltage. In addition, with the use of a cross-sectionalarea A of a channel formation region and a channel length L, offresistivity ρ is obtained by the formula of ρ=RA/L. Specifically, in theabove case, the off resistivity is greater than or equal to 1×10⁹ Ω·m(or greater than or equal to 1×10¹⁰ Ω·m). Note that with the use of thethickness d of the oxide semiconductor layer and the channel width W,the cross-sectional area A is represented by the formula of A=dW.

With the use of the oxide semiconductor layer 206 a, which is highlypurified to be an intrinsic oxide semiconductor layer in such a manner,the off current of the transistor can be reduced sufficiently.

Note that although, in this embodiment, the transistor 250 is usedinstead of the transistor 162 shown in the above embodiments, theinvention disclosed herein does not need to be construed as beinglimited to that case. For example, when the electric characteristics ofan oxide semiconductor are sufficiently increased, the oxidesemiconductor can be used for all the transistors including transistorsincluded in an integrated circuit. In such a case, it is not necessaryto employ a stacked-layer structure as shown in the above embodiments.Note that in order to realize favorable circuit operation, thefiled-effect mobility μ of the oxide semiconductor is preferably μ>100cm²/V·s. In addition, a semiconductor device can be formed using, forexample, a substrate such as a glass substrate.

The structures, methods, and the like described in this embodiment canbe combined as appropriate with any of the structures, methods, and thelike described in the other embodiments.

Embodiment 6

Next, another example of the manufacturing method of a transistorincluding an oxide semiconductor which can be used as the transistor 162or the like in the above embodiments (such as Embodiment 1) is describedwith reference to FIGS. 12A to 12E. In this embodiment, description ismade in detail on the case where, as an oxide semiconductor layer, afirst oxide semiconductor layer having a crystallized region and asecond oxide semiconductor layer that is obtained by crystal growth fromthe crystallized region of the first oxide semiconductor layer are used.Although a top-gate transistor is used as an example in the followingdescription, the structure of the transistor is not limited thereto.

First, an insulating layer 302 is formed over a lower layer substrate300. Next, a first oxide semiconductor layer is formed over theinsulating layer 302, and then subjected to first heat treatment so thata region including at least a surface of the first oxide semiconductorlayer is crystallized, whereby a first oxide semiconductor layer 304 isformed (see FIG. 12A).

For example, the lower layer substrate 300 can be a structure body belowthe interlayer insulating layer 128 of the semiconductor device in theabove embodiment (FIGS. 1A and 1B, FIGS. 6A and 6B, or the like). Forthe details thereof, the above embodiment can be referred to. It ispreferable that a surface of the lower layer substrate 300 be as flat aspossible. For example, difference in height on the surface may be lessthan or equal to 5 nm, or preferable less than or equal to 1 nm by achemical mechanical polishing method (a CMP method) or the like. Inaddition, a root-mean-square (RMS) of a surface roughness may be lessthan or equal to 2 nm, or preferable less than or equal to 0.4 nm.

The insulating layer 302 serves as a base and can be formed in a mannersimilar to that of the insulating layer 138, the insulating layer 144,or the like described in the above embodiments. The above embodimentscan be referred to for details of the insulating layer 302. Note that itis preferable to form the insulating layer 302 so as to contain hydrogenor water as little as possible.

The first oxide semiconductor layer can be formed in a manner similar tothat of the oxide semiconductor layer 206 described in the aboveembodiment. The above embodiment can be referred to for details of thefirst oxide semiconductor layer and a manufacturing method thereof. Notethat in this embodiment, the first oxide semiconductor layer isintentionally crystallized through the first heat treatment; therefore,the first oxide semiconductor layer is preferably formed using an oxidesemiconductor which causes crystallization easily. For example, ZnO orthe like can be given as such an oxide semiconductor. Further, it isalso preferable to use an In—Ga—Zn—O-based oxide semiconductor in whichthe proportion of Zn in metal elements (In, Ga, Zn) is greater than orequal to 60%, because an In—Ga—Zn—O-based oxide semiconductor containingZn at high concentration is easily crystallized. The thickness of thefirst oxide semiconductor layer is preferably greater than or equal to 3nm and less than or equal to 15 nm, and in this embodiment, 5 nm forexample. Note that the appropriate thickness of the first oxidesemiconductor layer differs depending on the oxide semiconductormaterial to be used, the intended purpose of a semiconductor device, orthe like; therefore, the thickness may be determined in accordance withthe material, the intended purpose, or the like.

The first heat treatment is performed at a temperature higher than orequal to 550° C. and lower than or equal to 850° C., preferably higherthan or equal to 600° C. and lower than or equal to 750° C. The time forthe first heat treatment is preferably longer than or equal to 1 minuteand shorter than or equal to 24 hours. The temperature and time of theheat treatment differ depending on the kind or the like of the oxidesemiconductor. In addition, the first heat treatment is preferablyperformed in an atmosphere that does not contain hydrogen or water, suchas an atmosphere of nitrogen, oxygen, or a rare gas (e.g., helium, neon,or argon), from which water is sufficiently removed.

The heat treatment apparatus is not limited to the electric furnace canbe an apparatus for heating an object to be processed by thermalconduction or thermal radiation from a medium such as a heated gas. Forexample, a rapid thermal annealing (RTA) apparatus such as a gas rapidthermal annealing (GRTA) apparatus or a lamp rapid thermal annealing(LRTA) apparatus can be used. An LRTA apparatus is an apparatus forheating an object to be processed by radiation of light (anelectromagnetic wave) emitted from a lamp such as a halogen lamp, ametal halide lamp, a xenon arc lamp, a carbon arc lamp, a high-pressuresodium lamp, or a high-pressure mercury lamp. A GRTA apparatus is anapparatus for performing heat treatment using a high-temperature gas. Asthe gas, an inert gas which does not react with an object to beprocessed by heat treatment, for example, nitrogen or a rare gas such asargon is used.

Through the aforementioned first heat treatment, a region including atleast the surface of the first oxide semiconductor layer iscrystallized. The crystallized region is formed in such a manner thatcrystal growth proceeds from the surface of the first oxidesemiconductor layer toward the inside of the first oxide semiconductorlayer. Note that in some cases, the crystallized region includes aplate-like crystal with an average thickness of greater than or equal to2 nm and less than or equal to 10 nm. In some cases, the crystallizedregion also includes a crystal which has an a-b surface substantiallyparallel to the surface of the oxide semiconductor layer and isc-axis-aligned in a direction substantially perpendicular to the surfaceof the oxide semiconductor layer. Here, a “direction substantiallyparallel” means a direction within ±10° of the parallel direction, and a“direction substantially perpendicular” means a direction within ±10° ofthe perpendicular direction.

Through the first heat treatment during which the crystallized region isformed, hydrogen (including water or hydroxyl groups) in the first oxidesemiconductor layer is preferably removed. In order to remove hydrogenor the like, the first heat treatment may be performed under anatmosphere of nitrogen, oxygen, or a rare gas (e.g., helium, neon, orargon), which has a purity of 6 N (99.9999%) or more (i.e., the impurityconcentration is less than or equal to 1 ppm), more preferably a purityof 7 N (99.99999%) or more (i.e., the impurity concentration is lessthan or equal to 0.1 ppm). Alternatively, the first heat treatment maybe performed in ultra-dry air containing H₂O with 20 ppm or less,preferably 1 ppm or less.

Furthermore, through the first heat treatment during which thecrystallized region is formed, oxygen is preferably supplied to thefirst oxide semiconductor layer. Oxygen can be supplied to the firstoxide semiconductor layer by, for example, changing the atmosphere forthe heat treatment to an oxygen atmosphere.

The first heat treatment in this embodiment is as follows: hydrogen orthe like is removed from the oxide semiconductor layer through heattreatment under a nitrogen atmosphere at 700° C. for one hour, and thenthe atmosphere is changed to an oxygen atmosphere so that oxygen issupplied to the inside of the first oxide semiconductor layer. Note thatthe main purpose of the first heat treatment is to form the crystallizedregion; accordingly, treatment for removing hydrogen or the like andtreatment for supplying oxygen may be performed separately. For example,heat treatment for crystallization can be performed after heat treatmentfor removing hydrogen or the like and treatment for supplying oxygen.

Through such first heat treatment, the crystallized region is formed,hydrogen (including water and hydroxyl groups) or the like is removed,and the first oxide semiconductor layer supplied with oxygen can beobtained.

Next, a second oxide semiconductor layer 305 is formed over the firstoxide semiconductor layer 304 including the crystallized region at leaston its surface (see FIG. 12B).

The second oxide semiconductor layer 305 can be formed in a mannersimilar to that of the oxide semiconductor layer 206 shown in the aboveembodiments. The above embodiments can be referred to for details of thesecond oxide semiconductor layer 305 and a manufacturing method thereof.Note that the second oxide semiconductor layer 305 is preferably formedto be thicker than the first oxide semiconductor layer 304. Further, thesecond oxide semiconductor layer 305 is preferably formed so that thetotal thickness of the first oxide semiconductor layer 304 and thesecond oxide semiconductor layer 305 are greater than or equal to 3 nmand less than or equal to 50 nm. Note that the appropriate thickness ofthe oxide semiconductor layer differs depending on the oxidesemiconductor material to be used, the intended purpose of asemiconductor device, or the like; therefore, the thickness may bedetermined in accordance with the material, the intended purpose, or thelike.

The second oxide semiconductor layer 305 and the first oxidesemiconductor layer 304 are preferably formed using materials which havethe same main component and have close lattice constants aftercrystallization (lattice mismatch is less than or equal to 1%). This isbecause in the crystallization of the second oxide semiconductor layer305, crystal growth easily proceeds from the crystallized region of thefirst oxide semiconductor layer 304 in the case where materials havingthe same main component are used. In addition, the use of materialshaving the same main component realizes favorable interface physicalproperties or electric characteristics.

Note that in the case where a desired film quality is obtained throughcrystallization, the second oxide semiconductor layer 305 may be formedusing a material which has a main component different from that of thematerial of the first oxide semiconductor layer 304.

Next, second heat treatment is performed on the second oxidesemiconductor layer 305, whereby crystal growth proceeds from thecrystallized region of the first oxide semiconductor layer 304, and asecond oxide semiconductor layer 306 is formed (see FIG. 12C).

The second heat treatment is performed at a temperature higher than orequal to 550° C. and lower than or equal to 850° C., preferably higherthan or equal to 600° C. and lower than or equal to 750° C. The time forthe second heat treatment is 1 minute to 100 hours inclusive, preferably5 hours to 20 hours inclusive, and typically 10 hours. Note that alsothe second heat treatment is preferably performed under an atmospherethat does not contain hydrogen or water.

Details of the atmosphere and the effect of the heat treatment aresimilar to those of the first heat treatment. The heat treatmentapparatus that can be used is also similar to that of the first heattreatment. For example, in the second heat treatment, a furnace isfilled with a nitrogen atmosphere when a temperature rises, and thefurnace is filled with an oxygen atmosphere when the temperature falls,whereby hydrogen or the like can be removed under the nitrogenatmosphere and oxygen can be supplied under the oxygen atmosphere.

Through the aforementioned second heat treatment, crystal growth canproceed from the crystallized region of the first oxide semiconductorlayer 304 to the whole of the second oxide semiconductor layer 305, sothat the second oxide semiconductor layer 306 can be formed. Inaddition, it is possible to form the second oxide semiconductor layer306 from which hydrogen (including water and hydroxyl groups) or thelike is removed and to which oxygen is supplied. Furthermore, theorientation of the crystallized region of the first oxide semiconductorlayer 304 can be improved through the second heat treatment.

For example, in the case where an In—Ga—Zn—O-based oxide semiconductormaterial is used for the second oxide semiconductor layer 306, thesecond oxide semiconductor layer 306 can include a crystal representedby InGaO₃(ZnO)_(m) (m is a natural number), a crystal represented byIn₂Ga₂ZnO₇ (In:Ga:Zn:O=2:2:1:7), or the like. Such crystals are alignedthrough the second heat treatment so that a c-axis is in a directionsubstantially perpendicular to the surface of the second oxidesemiconductor layer 306 a.

Here, the aforementioned crystals include any of In, Ga, and Zn, and canbe considered to have a stacked-layer structure of layers parallel to ana-axis and a b-axis. Specifically, the aforementioned crystals have astructure in which a layer containing In and a layer not containing In(a layer containing Ga or Zn) are stacked in the c-axis direction.

In an In—Ga—Zn—O-based oxide semiconductor crystal, a layer containingIn in an in-plane direction, that is, a layer in a direction parallel tothe a-axis and the b-axis has favorable conductivity. This is becauseelectrical conduction in the In—Ga—Zn—O-based oxide semiconductorcrystal is mainly controlled by In, and the 5s orbital of an In atomoverlaps with the 5s orbital of an adjacent In atom, so that a carrierpath is formed.

Further, in the case where the first oxide semiconductor layer 304includes an amorphous region at the interface with the insulating layer302, through the second heat treatment, crystal growth proceeds in somecases from the crystallized region formed on the surface of the firstoxide semiconductor layer 304 toward the bottom of the first oxidesemiconductor layer to crystallize the amorphous region. Note that insome cases, the amorphous region remains depending on the material ofthe insulating layer 302, the heat treatment conditions, and the like.

In the case where the first oxide semiconductor layer 304 and the secondoxide semiconductor layer 305 are formed using oxide semiconductormaterials having the same main component, in some cases, the first oxidesemiconductor layer 304 and the second oxide semiconductor layer 306have the same crystal structure, as illustrated in FIG. 12C. Therefore,although indicated by a dotted line in FIG. 12C, the boundary betweenthe first oxide semiconductor layer 304 and the second oxidesemiconductor layer 306 cannot be distinguished in some cases so thatthe first oxide semiconductor layer 304 and the second oxidesemiconductor layer 306 can be considered as the same layer.

Next, the first oxide semiconductor layer 304 and the second oxidesemiconductor layer 306 are processed with a method such as etchingusing a mask, whereby an island-shaped first oxide semiconductor layer304 a and an island-shaped second oxide semiconductor layer 306 a areformed (see FIG. 12D). Note that here, processing into the island-shapedoxide semiconductor is performed after the second heat treatment;however, the second heat treatment may be performed after processinginto the island-shaped oxide semiconductor layer. In this case, there isan advantage that time for etching can be shortened even when wetetching is used.

As an etching method for the first oxide semiconductor layer 304 and thesecond oxide semiconductor layer 306, either dry etching or wet etchingmay be employed. It is needless to say that dry etching and wet etchingcan be used in combination. The etching conditions (e.g., an etching gasor an etchant, etching time, and temperature) are set as appropriatedepending on the material so that the oxide semiconductor layer can beetched into a desired shape. The first oxide semiconductor layer 304 andthe second oxide semiconductor layer 306 can be etched in a mannersimilar to that of the oxide semiconductor layer shown in the aboveembodiments. The above embodiments can be referred to for details of theetching.

A region of the oxide semiconductor layers, which becomes a channelformation region, preferably has a planarized surface. For example, thesurface of the second oxide semiconductor layer 306 preferably has apeak-to-valley height of 1 nm or less (more preferably 0.2 nm or less)in a region overlapping with a gate electrode (the channel formationregion).

Next, a conductive layer is formed to be in contact with the secondoxide semiconductor layer 306 a. Then, a source or drain electrode 308 aand a source or drain electrode 308 b are formed by selectively etchingthe conductive layer (see FIG. 12D). The source or drain electrode 308 aand the source or drain electrode 308 b can be formed in a mannersimilar to that of the source or drain electrode 142 a and the source ordrain electrode 142 b shown in the above embodiments. The aboveembodiments can be referred to for details of the source or drainelectrode 308 a and the source or drain electrode 308 b

In the step illustrated in FIG. 12D, crystal layers on the side surfacesof the first oxide semiconductor layer 304 a and the second oxidesemiconductor layer 306 a, which are in contact with the source or drainelectrode 308 a and the source or drain electrode 308 b, are broughtinto an amorphous state in some cases. For this reason, all the regionsof the first oxide semiconductor layer 304 a and the second oxidesemiconductor layer 306 a do not always have a crystal structure.

Next, a gate insulating layer 312 in contact with part of the secondoxide semiconductor layer 306 a is formed. The gate insulating layer 312can be formed with a CVD method or a sputtering method. Then, a gateelectrode 314 is formed over the gate insulating layer 312 in a regionoverlapping with the first oxide semiconductor layer 304 a and thesecond oxide semiconductor layer 306 a. After that, an interlayerinsulating layer 316 and an interlayer insulating layer 318 are formedover the gate insulating layer 312 and the gate electrode 314 (see FIG.12E). The gate insulating layer 312, the gate electrode 314, theinterlayer insulating layer 316, and the interlayer insulating layer 318can be formed in a manner similar to that of the insulating layer 138,the gate electrode 148 a, the interlayer insulating layer 216, theinterlayer insulating layer 218, or the like shown in the aboveembodiments. The above embodiments can be referred to for details of thegate insulating layer 312, the gate electrode 314, the interlayerinsulating layer 316, and the interlayer insulating layer 318.

After the gate insulating layer 312 is formed, third heat treatment ispreferably performed under an inert gas atmosphere or an oxygenatmosphere. The third heat treatment is performed at a temperaturehigher than or equal to 200° C. and lower than or equal to 450° C.,preferably higher than or equal to 250° C. and lower than or equal to350° C. For example, the heat treatment may be performed at 250° C. forone hour under an atmosphere containing oxygen. The third heat treatmentcan reduce variation in electric characteristics of the transistor. Inthe case where the gate insulating layer 312 contains oxygen, bysupplying oxygen to the second oxide semiconductor layer 306 a to makeup oxygen deficiency of the second oxide semiconductor layer 306 a, ani-type (intrinsic) or substantially i-type oxide semiconductor layer canalso be formed.

Note that although the third heat treatment is performed in thisembodiment after the gate insulating layer 312 is formed, the timing ofthe third heat treatment is not limited thereto. Further, the third heattreatment may be omitted in the case where oxygen is supplied to thesecond oxide semiconductor layer through other treatment such as thesecond heat treatment.

Through the above steps, a transistor 350 is completed. The transistor350 uses the first oxide semiconductor layer 304 a and the second oxidesemiconductor layer 306 a which is obtained by crystal growth from thecrystallized region of the first oxide semiconductor layer 304 a (seeFIG. 12E).

The transistor 350 illustrated in FIG. 12E includes the following: thefirst oxide semiconductor layer 304 a provided over the bottom substrate300 with the insulating layer 302 interposed therebetween; the secondoxide semiconductor layer 306 a provided over the first oxidesemiconductor layer 304 a; the source or drain electrode 308 a and thesource or drain electrode 308 b electrically connected to the secondoxide semiconductor layer 306 a; the gate insulating layer 312 coveringthe second oxide semiconductor layer 306 a, the source or drainelectrode 308 a, and the source or drain electrode 308 b; the gateelectrode 314 over the gate insulating layer 312; the interlayerinsulating layer 316 over the gate insulating layer 312 and the gateelectrode 314; and the interlayer insulating layer 318 over theinterlayer insulating layer 316.

In the transistor 350 shown in this embodiment, the first oxidesemiconductor layer 304 a and the second oxide semiconductor layer 306 aare highly purified. Therefore, the concentration of hydrogen in thefirst oxide semiconductor layer 304 a and the second oxide semiconductorlayer 306 a is less than or equal to 5×10¹⁹/cm³, preferably less than orequal to 5×10¹⁸/cm³, and more preferably less than or equal to5×10¹⁷/cm³. In addition, the carrier density of the oxide semiconductorlayer is sufficiently low (e.g., less than 1×10¹²/cm³, preferably lessthan 1.45×10¹⁰/cm³) as compared to that of a typical silicon wafer(approximately 1×10¹⁴/cm³). As a result of this, a sufficiently lowoff-state current can be obtained. For example, in the case where achannel length of the transistor is 10 μm and the thickness of the oxidesemiconductor layer is 30 nm, when a drain voltage ranges from 1 V to 10V, the off current (a drain current when a gate-source voltage is lessthan or equal to 0 V) is less than or equal to 1×10⁻¹³ A. Further, offcurrent density (a value obtained by dividing the off current by achannel width of the transistor) at room temperature is approximately1×10⁻²⁰ A/μm (10 zA/μm) to 1×10⁻¹⁹ A/μm (100 zA/μm).

Note that characteristics of the above transistor can be representedusing off resistance (a resistance value when the transistor is turnedoff) or off resistivity (resistivity when the transistor is turned off)in addition to the off current or the off current density. Here, withthe use of the off current and the drain voltage, off resistance R is avalue obtained by Ohm's law. In addition, with the use of across-sectional area A of a channel formation region and a channellength L, off resistivity ρ is a value obtained by the formula ofρ=RA/L. Specifically, in the above case, the off resistivity is greaterthan or equal to 1×10⁹ Ω·m (or greater than or equal to 1×10¹⁰ Ω·m).Note that with the use of the thickness d of the oxide semiconductorlayer and the channel width W, the cross-sectional area A is representedby the formula of A=dW.

In this manner, by using the highly-purified and intrinsic first oxidesemiconductor layer 304 a and second oxide semiconductor layer 306 a,the off current of the transistor can be sufficiently reduced.

Furthermore, in this embodiment, the first oxide semiconductor layer 304a having a crystallized region and the second oxide semiconductor layer306 a which is obtained by crystal growth from the crystallized regionof the first oxide semiconductor layer 304 a are used as the oxidesemiconductor layer. Thus, the field-effect mobility can be increasedand a transistor with favorable electric characteristics can berealized.

Note that although, in this embodiment, the transistor 350 is usedinstead of the transistor 162 shown in the above embodiment, theinvention disclosed herein does not need to be construed as beinglimited to that case. For example, the transistor 350 shown in thisembodiment uses the first oxide semiconductor layer 304 a having acrystallized region and the second oxide semiconductor layer 306 a whichis obtained by crystal growth from the crystallized region of the firstoxide semiconductor layer 304 a, and thus has a high field-effectmobility. Accordingly, the oxide semiconductor can be used for all thetransistors including transistors included in an integrated circuit. Insuch a case, it is not necessary to employ a stacked-layer structure asshown in the above embodiments. Note that in order to realize favorablecircuit operation, the filed-effect mobility μ of the oxidesemiconductor is preferably μ>100 cm²/V·s. In addition, in this case, asemiconductor device can be formed using, for example, a substrate suchas a glass substrate.

The structures, methods, and the like described in this embodiment canbe combined as appropriate with any of the structures, methods, and thelike described in the other embodiments.

Embodiment 7

In this embodiment, a method for manufacturing a semiconductor devicewhich is different from the method for manufacturing a semiconductordevice described in Embodiment 1 is described. A feature of thisembodiment is that a gate electrode of a transistor in a lower portionis formed by a so-called damascene method, and a source electrode, adrain electrode, and the like of a transistor in an upper portion areformed using the material of the gate electrode.

First, a state of FIG. 4G is obtained by the method described inEmbodiment 1. The state is illustrated in FIG. 13A. An interlayerinsulating layer 126 and an interlayer insulating layer 128 are polishedusing a CMP method or the like, so that a top surface of a gateelectrode 110 is exposed. Then, the gate electrode 110 is etched by aselective-etching method, so that a hole portion 127 is formed (see FIG.13B).

Next, a conductive layer including metal or metal nitride is formed by adeposition method by which the hole portion 127 is completely embedded.The conductive layer may be a single layer or a stacked layer. Then, theconductive layer is etched, so that electrode layers (a source or drainelectrode 142 a and a source or drain electrode 1426) are obtained (seeFIG. 13C). A structure at this stage is equivalent to the structure ofFIG. 5B described in Embodiment 1.

After that, in a similar manner to Embodiment 1, an island-shaped oxidesemiconductor layer 140, a gate insulating layer 146, a gate electrode148 a, and an electrode 1486 are formed (see FIG. 13D). It is noted thatthe electrode layer (the source or drain electrode 142 a) is the gateelectrode of the transistor in the lower portion and also the source ordrain electrode of the transistor in the upper portion. In thisembodiment, a step for forming a contact hole reaching the gateelectrode 110 of the transistor in the lower portion, which is needed inEmbodiment 1, can be omitted. In this embodiment, since theisland-shaped oxide semiconductor layer 140 is in contact with theinterlayer insulating layer 128, a surface of the interlayer insulatinglayer 128 is preferably dehydrogenated sufficiently before theisland-shaped oxide semiconductor layer 140 is formed.

Embodiment 8

In this embodiment, the case where the semiconductor device described inthe above embodiments is applied to electronic appliances is describedwith reference to FIGS. 14A to 14F. The case where the above describedsemiconductor device is applied to electronic appliances such as acomputer, a mobile phone set (also referred to as a mobile phone or amobile phone device), a personal digital assistant (including a portablegame machine, an audio reproducing device and the like), a digitalcamera, a digital video camera, an electronic paper, a television set(also referred to as a television or a television receiver) and the likeis described.

FIG. 14A shows a notebook personal computer including a housing 401, ahousing 402, a display portion 403, a keyboard 404 and the like. Thesemiconductor device shown in the foregoing embodiment is provided inthe housing 401 and the housing 402. Thus, a notebook PC withsufficiently low power consumption in which writing and reading of datacan be performed at high speed and data can be stored for a long timecan be realized.

FIG. 14B shows a personal digital assistant (PDA) including a main body411 provided with a display portion 413, an external interface 415, anoperation button 414, and the like. A stylus 412 and the like operatingthe personal digital assistant are also provided. The semiconductordevice shown in the foregoing embodiment is provided in the main body411. Therefore, a personal digital assistant with sufficiently low powerconsumption in which writing and reading of data can be performed athigh speed and data can be stored for a long time can be realized.

FIG. 14C shows an e-book reader 420 with electronic paper attachedincluding two housings 421 and 423. A display portion 425 and a displayportion 427 are provided in the housing 421 and the housing the 423,respectively. The housings 421 and 423 are connected by a hinge portion437 and can be opened or closed with the hinge portion 437. The housing421 is provided with a power switch 431, operation keys 433, a speaker435 and the like. The semiconductor device shown in the above embodimentis provided at least in one of the housings 421 and 423. Therefore, ane-book reader with sufficiently low power consumption in which writingand reading of data can be performed at high speed and data can bestored for a long time can be realized.

FIG. 14D is a mobile phone including two housings 440 and 441. Moreover,the housings 440 and 441 which are shown unfolded in FIG. 14D canoverlap with each other by sliding. Thus, the mobile phone can be in asuitable size for portable use. The housing 441 includes a display panel442, a speaker 443, a microphone 444, a pointing device 446, a cameralens 447, an external connection terminal 448 and the like. The housing440 is provided with a solar cell 449 for charging the mobile phone, anexternal memory slot 450 and the like. In addition, an antenna isincorporated in the housing 441. The semiconductor device shown in theabove embodiment is provided at least in one of the housings 440 and441. Thus, a mobile phone with sufficiently low power consumption inwhich writing and reading of data can be performed at high speed anddata can be stored for a long time can be realized.

FIG. 14E is a digital camera including a main body 461, a displayportion 467, an eyepiece portion 463, an operation switch 464, a displayportion 465, a battery 466 and the like. The semiconductor device shownin the foregoing embodiment is provided in the main body 461. Therefore,a digital camera with sufficiently low power consumption in whichwriting and reading of data can be performed at high speed and data canbe stored for a long time can be realized.

FIG. 14F is a television set 470 including a housing 471, a displayportion 473, a stand 475 and the like. The television set 470 can beoperated by an operation switch of the housing 471 and a remotecontroller 480. The semiconductor device shown in the above embodimentis mounted in the housing 471 and the remote controller 480. Thus, atelevision set with sufficiently low power consumption in which writingand reading of data can be performed at high speed and data can bestored for a long time can be realized.

As described above, a semiconductor device related to the aboveembodiment is mounted in the electronic appliances shown in thisembodiment. Therefore, an electronic appliance whose power consumptionis sufficiently reduced can be realized.

Example 1

The number of times the semiconductor device according to an embodimentof the disclosed invention can rewrite data was examined. In thisexample, the examination results are described with reference to FIG.15.

A semiconductor device used for the examination is the semiconductordevice having the circuit configuration in FIG. 3A1. Here, an oxidesemiconductor was used in a transistor corresponding to a transistor162. In addition, as a capacitor corresponding to a capacitor 164, acapacitor having a capacitance value of 0.33 pF was used.

The examination was performed by comparing the initial memory windowwidth and the memory window width at the time after retention andwriting data were repeated predetermined times. Data was retained andwritten by applying 0 V or 5 V to a wiring corresponding to the thirdwiring in FIG. 3M and applying 0 V or 5 V to a wiring corresponding tothe fourth wiring in FIG. 3A1. When the potential of the wiringcorresponding to the fourth wiring is 0 V, the transistor correspondingto the transistor 162 is off; thus, a potential supplied to a floatinggate portion FG is retained. When the potential of the wiringcorresponding to the fourth wiring is 5 V, the transistor correspondingto the transistor 162 is on; thus, a potential of the wiringcorresponding to the third wiring is supplied to the floating gateportion FG.

The memory window width is one of indicators of characteristics of amemory device. Here, the memory window width represents the shift amountΔV_(eg) in curves (V_(eg)−I_(d) curves) between different memory states,which show the relation between the potential Vcg of a wiringcorresponding to the fifth wiring and a drain current I_(d) of atransistor corresponding to the transistor 160. The different memorystates mean a state where 0 V is applied to the floating gate portion FG(hereinafter referred to as a low state) and a state where 5 V isapplied to the floating gate FG (hereinafter referred to as a highstate). That is, the memory window width can be checked by sweeping thepotential V_(eg) in the low state and in the high state.

FIG. 15 shows the examination results of the initial memory window widthand the memory window width at the time after writing is performed 1×10⁹times. Note that in FIG. 15, the horizontal axis shows a V_(eg) (V) andthe vertical axis shows I_(d) (A). It can be confirmed from FIG. 15 thatthe memory window width is not changed between before and after writingis performed 1×10⁹ times. From the fact that the memory window width isnot changed between before and after writing is performed 1×10⁹ times,it is shown that the semiconductor device is not deteriorated at leastduring the writing.

As described above, characteristics of the semiconductor deviceaccording to an embodiment of the disclosed invention are not changedeven when retention and writing are repeated many times. That is,according to an embodiment of the disclosed invention, a semiconductordevice with extremely high reliability can be obtained.

This application is based on Japanese Patent Application serial no.2009-288474 filed with Japan Patent Office on Dec. 18, 2009 and JapanesePatent Application serial no. 2009-294790 filed with Japan Patent Officeon Dec. 25, 2009, the entire contents of which are hereby incorporatedby reference.

1. A semiconductor device comprising: a first transistor comprising: achannel formation region; a first impurity region and a second impurityregion with the channel formation region interposed between the firstimpurity region and the second impurity region; a first insulating layerover the channel formation region; a first gate electrode over thechannel formation region with the first insulating layer interposedtherebetween; a first electrode electrically connected to the firstimpurity region; and a second electrode electrically connected to thesecond impurity region; a second transistor comprising: an oxidesemiconductor layer; a third electrode and a fourth electrode, each ofthe third electrode and the fourth electrode electrically connected tothe oxide semiconductor layer; a second insulating layer over the oxidesemiconductor layer, the third electrode, and the fourth electrode; anda second gate electrode overlapping the oxide semiconductor layer withthe second insulating layer interposed therebetween; a capacitor elementcomprising: the third electrode; the second insulating layer; and afifth electrode overlapping the third electrode with the secondinsulating layer interposed therebetween, wherein the first gateelectrode and the third electrode are electrically connected to eachother.
 2. A semiconductor device comprising: a first gate electrode overa semiconductor with a first insulating layer interposed therebetween; asecond insulating layer over the first gate electrode; a first electrodeand a second electrode over the second insulating layer; an oxidesemiconductor layer over the second insulating layer and electricallyconnected to the first electrode and the second electrode; a thirdinsulating layer over the first electrode, the second electrode, and theoxide semiconductor layer; a third electrode over the first electrodewith the third insulating layer interposed therebetween; and a secondgate electrode over the oxide semiconductor layer with the thirdinsulating layer interposed therebetween, wherein the first gateelectrode and the first electrode are electrically connected to eachother.
 3. The semiconductor device according to claim 2, wherein thesemiconductor is a semiconductor substrate.
 4. The semiconductor deviceaccording to claim 2, further comprising a sidewall insulator in contactwith a side of the first gate electrode.
 5. The semiconductor deviceaccording to claim 2, wherein the semiconductor comprises a firstimpurity region, a second impurity region, and a channel formationregion between the first impurity region and the second impurity region,and wherein the channel formation region is overlapped with the firstgate electrode.
 6. The semiconductor device according to claim 2,wherein the oxide semiconductor layer comprises indium and gallium. 7.The semiconductor device according to claim 2, wherein the thirdelectrode overlaps the oxide semiconductor layer.
 8. The semiconductordevice according to claim 2, further comprising a fourth insulatinglayer between the oxide semiconductor layer and the first electrode,wherein the fourth insulating layer comprises an opening at a regionoverlapped with the third electrode, and wherein the oxide semiconductorlayer is provided in the opening.
 9. The semiconductor device accordingto claim 2, wherein the oxide semiconductor layer and each of the firstelectrode and the second electrode are in direct contact with each otherat a top surface of the oxide semiconductor layer.
 10. An electronicappliance comprising the semiconductor device according to claim 2,wherein the electronic appliance is one selected from the groupconsisting of a computer, a mobile phone, a personal digital assistant,a digital camera, a digital video camera, an electronic paper, and atelevision.
 11. A memory device comprising the semiconductor deviceaccording to claim 2.